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arXiv 2504.14031cond-mat.mtrl-sci
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二维过渡金属二硫化物中的调制掺杂与载流子浓度控制

Modulation doping and control the carrier concentration in 2-dimensional transition metal dichalcogenides

Nikhil Sivadas, Yongwoo Shin

AI总结:

针对二维过渡金属二硫化物(TMDs)可控掺杂难题,提出可通过传统栅极介电氧化物掺杂候选元素实现TMD沟道p型/n型掺杂,经第一性原理计算验证Ni掺杂HfO₂可调制WSe₂空穴浓度,为TMD基晶体管商业化提供支撑。

摘要:

二维过渡金属二硫化物(TMDs)作为晶体管技术中后硅沟道候选材料受到关注,但可控掺杂TMDs仍具挑战。本研究提出一系列候选元素,将其掺杂到传统栅极介电氧化物中可诱导TMD沟道的p型和n型掺杂。为验证筛选出的调制掺杂候选元素,通过第一性原理计算证明:在界面介电层HfO₂中掺杂Ni可实现单层WSe₂的p型掺杂;改变Ni掺杂率可将WSe₂中的诱导空穴浓度调至与沟道静电栅极控制兼容的值。本研究结果对TMD基晶体管的商业可行性具有重要意义。

英文摘要:

Two-dimensional transition-metal dichalcogenides (TMDs) have attracted interest as post-Si channel candidates in transistor technology. However, despite their potential benefits, controllably doping TMDs has proven difficult. In this work, we proposed a list of candidate elements that can induce p-type and n-type doping in the TMD channel when they are doped onto conventional gate-dielectric oxides. To verify the screened modulation doping candidates, we demonstrate using first-principles calculations the p-doping of monolayer WSe$_2$ by doping Ni int\textbf{}o the interface dielectric HfO$_2$ layer. The induced hole concentration in the WSe$_2$ can be tuned to values compatible with electrostatic gate control of the channel by changing the Ni doping rate. The results of this study will have essential implications for the commercial viability of TMD-based transistors.

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