通过分子动力学和原子力显微镜研究等离子体改性工艺消除金属薄膜上的纳米级凸起
Eliminating nanometer-scale asperities on metallic thin films through plasma modification processes studied by molecular dynamics and AFM
AI总结：
本研究通过分子动力学模拟和原子力显微镜等实验，探究等离子体辅助工艺消除金属薄膜纳米级凸起的效果，发现较重惰性气体可高效减小凸起且不显著降低材料厚度，为纳米级表面形貌控制提供参考。
摘要：
我们通过模拟和实验报道了等离子体辅助表面改性工艺对金属表面纳米级凸起尺寸的减小效果。采用分子动力学（MD）模拟，将多种惰性气体离子（Ne、Ar、Kr和Xe）辐照到表面具有纳米级凸起的钴薄板上。MD模拟显示，随着惰性气体原子序数增加，表面凸起尺寸减小更高效，而蚀刻速率降低。惰性气体离子散射行为的依赖性源于工作气体离子与薄板原子间的质量交换。对经过表面改性工艺的硬盘介质进行了原子力显微镜和X射线荧光测量。这些测量实验表明，随着惰性气体原子序数增加，纳米级凸起密度降低，蚀刻速率降低，与模拟结果一致。通过这项研究，我们阐明了较重的工作气体在不显著降低材料厚度的情况下更有效地减小表面凸起尺寸，这有助于更好地控制纳米级表面形貌。
英文摘要：
We report the effects of reducing surface asperity size at the nanometer scale on metallic surfaces by plasma-assisted surface modification processes using simulations and experiments. Molecular dynamics (MD) simulations were conducted by irradiating various inert gas ions (Ne, Ar, Kr, and Xe) onto a cobalt slab with nanoscale asperities on the surface. The MD simulations showed that as the atomic number of the inert gas increased the surface asperity size was reduced more efficiently, while the etching rate decreased. The dependencies of the scattering behaviors on the inert gas ions originated from the mass exchange between the working gas ions and the slab atoms. Atomic force microscopy and x-ray fluorescence measurements were performed on hard disk media subjected to the surface modification processes. These measurements experimentally demonstrated that the density of nanoscale asperities was reduced with a lower etching rate as the atomic number of the inert gas increased, consistent with the simulation results. Through this study, we clarified that heavier working gases were more effective in reducing surface asperity size without significantly reducing the thickness of the material, which can contribute to better control of surface morphologies at the nanometer scale.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
