arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2409.03468cond-mat.mtrl-sci
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任意形貌基底上小固体颗粒的动力学

Dynamics of Small Solid Particles on Substrates of Arbitrary Topography

Quan Zhao, Wei Jiang, Yan Wang, David J. Srolovitz, Tiezheng Qian, Weizhu Bao

AI总结:

本文基于 Onsager 变分原理建立任意弯曲基底上小固体颗粒的降阶动力学模型,证明颗粒以正比于曲率梯度、反比于颗粒尺寸的速度向低平均曲率区域运动,并通过二维和三维尖锐界面模型数值验证。

摘要:

我们研究由毛细作用驱动的弯曲基底上薄膜去润湿所产生的小固体颗粒的动力学,其中质量输运由表面扩散控制。我们考虑沉积颗粒尺寸远小于基底表面局部曲率半径的情形。应用 Onsager 变分原理,得到任意弯曲基底上颗粒动力学行为的降阶模型。我们证明颗粒以确定的速度向基底表面平均曲率较低的区域运动。特别地,该速度正比于基底曲率梯度,反比于颗粒尺寸,其系数依赖于材料性质,包括表面能、表面扩散率、密度和 Young(润湿)角。通过与二维和三维完整尖锐界面模型的数值结果进行比较,验证了该降阶模型。

英文摘要:

We study the dynamics of a small solid particle arising from the dewetting of a thin film on a curved substrate driven by capillarity, where mass transport is controlled by surface diffusion. We consider the case when the size of the deposited particle is much smaller than the local radius of curvature of the substrate surface. The application of the Onsager variational principle leads to a reduced-order model for the dynamic behaviour of particles on arbitrarily curved substrates. We demonstrate that particles move toward region of the substrate surface with lower mean curvature with a determined velocity. In particular, the velocity is proportional to the substrate curvature gradient and inversely proportional to the size of the particle, with a coefficient that depends on material properties that include the surface energy, surface diffusivity, density, and Young's (wetting) angle. The reduced model is validated by comparing with numerical results for the full, sharp-interface model in both two and three dimensions.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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