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arXiv 2402.06283physics.optics
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用于断层体积增材制造的波动光学模型

Wave optical model for tomographic volumetric additive manufacturing

Felix Wechsler, Carlo Gigli, Jorge Madrid-Wolff, Christophe Moser

AI总结:

针对TVAM因射线光学假设导致分辨率受限的问题,提出基于平面波角谱法的严格波动光学振幅优化方案,使全体积高分辨率打印在理论与模拟上成为可能,实现微米级特征。

摘要:

Tomographic Volumetric Additive Manufacturing (TVAM) 允许在几秒或几分钟内打印介观物体。断层图案被投射到装有光敏树脂的旋转玻璃瓶上。目前的图案优化基于射线光学假设,最终导致分辨率限制在约 $20μ\ extrm{m}$ 左右,且在整个 3D 物体体积内存在变化。在这项工作中,我们为 TVAM 引入了一种严格的基于波的光学振幅优化方案,表明在全体积内进行高分辨率打印在理论上是可行的。该波动光学优化方法基于高效的平面波角谱法,结合自定义编写的高内存效率梯度,能够对 TVAM 的真实体积进行优化,例如 $(100μ\ extrm{m})^3$ 或 $(10\ extrm{mm})^3$,包含 $550^3$ 个体素和 600 个角度。我们的模拟表明,当所需特征为 $20μ\ extrm{m}$ 及以下时,射线光学开始产生伪影;更重要的是,使用全波模型优化图案时,振幅调制的 TVAM 能够实现微米级特征。

英文摘要:

Tomographic Volumetric Additive Manufacturing (TVAM) allows printing of mesoscopic objects within seconds or minutes. Tomographic patterns are illuminated onto a rotating glass vial which contains a photosensitive resin. Current pattern optimization is based on a ray optical assumption which ultimately leads to limited resolution around $20μ\textrm{m}$ and varying throughout the volume of the 3D object. In this work, we introduce a rigorous wave-based optical amplitude optimization scheme for TVAM which shows that high-resolution printing is theoretically possible over the full volume. The wave optical optimization approach is based on an efficient angular spectrum method of plane waves with custom written memory efficient gradients and allows for optimization of realistic volumes for TVAM such as $(100μ\textrm{m})^3$ or $(10\textrm{mm})^3$ with $550^3$ voxels and 600 angles. Our simulations show that ray-optics start to produce artifacts when the desired features are $20μ\textrm{m}$ and below and more importantly, the amplitude modulated TVAM can reach micrometer features when optimizing the patterns using a full wave model.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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