arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2302.09774cond-mat.mtrl-scicond-mat.mes-hallphysics.app-ph
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铁磁Gd $_5$ Si $_4$ -Fe $_3$ O $_4$双层薄膜异质结构的磁性

Magnetic properties of ferromagnetic Gd$_5$Si$_4$-Fe$_3$O$_4$ bilayer thin film heterostructure

Shivakumar Hunagund, V Santiago, C Castano

摘要:

薄膜的磁性不同于相应的块体材料,并且由于其尺寸和维度的减小而显示出新颖的物理特性。不同材料的薄膜界面之间的交换偏置也会导致磁特性的深刻变化。本文采用高真空射频磁控溅射法在硅衬底上制备了不同厚度的Fe $_3$ O $_4$、Gd $_5$ Si $_4$和Fe $_3$ O $_4$ -Gd $_5$ Si $_4$双层薄膜。它们的磁化强度在室温下在3 T的磁场和50 K至400 K的温度之间进行了测量。Gd 5Si 4薄膜由于暴露于空气中而导致氧化。所有样品的沉积膜厚度均大于50 nm,表现出铁磁性。

英文摘要:

Magnetic properties of thin films differs from that of the corresponding bulk materials and show novel physics as a result of their reduced size and dimensionality. Profound changes in magnetic properties can also result with exchange bias between the interface of the thin films of different materials. Here we present Fe$_3$O$_4$, Gd$_5$Si$_4$ and Fe$_3$O$_4$-Gd$_5$Si$_4$ bilayer thin films of varying thicknesses were prepared by RF Magnetron sputtering of Fe$_3$O$_4$ and Gd$_5$Si$_4$ targets on silicon substrates in high vacuum. Their magnetization was measured at room temperature in fields of 3T and between 50 K to 400 K temperatures. Gd5Si4 films resulted in oxidation due to the exposure to the air. Deposited film thickness of all the specimens are larger than 50nm and show ferromagnetic behavior.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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