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arXiv 2206.04052physics.ins-dethep-ex
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被测 GEM 箔可能退化的可视化研究

Visual investigation of possible degradation in GEM foil under test

S. Chatterjee, A. Sen, S. Das, S. Biswas

AI总结:

针对低电阻 SM GEM 箔的疑似退化问题,本文借助光学显微镜扫描识别缺陷,并采用多种清洁方法消除电极短路,给出清洁工艺细节及清洁后的漏电流测量结果。

摘要:

本文使用光学显微镜,手动对一片呈现小电阻(约 40 kΩ)的 Single Mask(SM,单掩模)Gas Electron Multiplier(GEM,气体电子倍增器)箔进行了可视化研究。对该 GEM 箔进行扫描,并识别出箔中的各种缺陷。采用不同技术清洁 GEM 箔,以去除 GEM 电极之间形成的短路通路。文中讨论了用于清洁 GEM 箔的方法细节,以及箔清洁后的漏电流测量结果。

英文摘要:

Visual investigation of a Single Mask (SM) Gas Electron Multiplier (GEM) foil, showing small resistance~($\sim$ 40 k$Ω$), is performed manually using an optical microscope. The GEM foil is scanned and the different imperfections in the foil are identified. Different techniques are used to clean the GEM foil to remove the short paths created between the GEM electrodes. The details of the method used for cleaning the GEM foil and the result of leakage current measurement after the cleaning of the foil are discussed in this article.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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