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arXiv 2201.03798cond-mat.mtrl-sci
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具有多界面自由层的垂直磁性隧道结

Perpendicular magnetic tunnel junctions with multi-interface free layer

Pravin Khanal, Bowei Zhou, Magda Andrade, Yanliu Dang, Albert Davydov, Ali Habiboglu, Jonah Saidian, Adam Laurie, Jian-Ping Wang, Daniel B Gopman, Weigang Wang

摘要:

未来几代的磁性随机存取存储器要求磁性隧道结能够同时提供高磁阻、强保持、低开关能量和小于10 nm的小单元尺寸。在这里,我们研究垂直磁性隧道结与复合自由层,多个铁磁/非磁界面可以有助于热稳定性。在这些多界面自由层中,采用不同的掺杂材料(MgO、Ta、Mo)作为耦合层。研究了不同退火条件下的结特性演化。已观察到的第一CoFeB层的厚度上的隧穿磁电阻的强烈依赖性。在使用Mo和MgO作为耦合层的结中,在400°C退火后已经实现了大于200%的大隧穿磁阻。

英文摘要:

Future generations of magnetic random access memory demand magnetic tunnel junctions that can provide simultaneously high magnetoresistance, strong retention, low switching energy and small cell size below 10nm. Here we study perpendicular magnetic tunnel junctions with composite free layers where multiple ferromagnet/nonmagnet interfaces can contribute to the thermal stability. Different nonmagnetic materials (MgO, Ta, Mo) have been employed as the coupling layers in these multi-interface free layers. The evolution of junction properties under different annealing conditions is investigated. A strong dependence of tunneling magnetoresistance on the thickness of the first CoFeB layer has been observed. In junctions where Mo and MgO are used as coupling layers, large tunneling magnetoresistance above 200% has been achieved after 400°C annealing.

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