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arXiv 2201.03436cond-mat.mes-hallphysics.app-ph
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关于本征单载波器件的注入

On Injection in Intrinsic Single-Carrier Devices

Jason A. Röhr

摘要:

通过考虑作为注入势垒高度的函数的单载流子器件的界面电荷载流子密度的变化,并将其与具有欧姆接触的器件的平衡、背景电荷载流子密度进行比较,我们计算出当这些势垒预期限制注入时的简单条件,从而显著影响器件中的空间电荷限制电流。我们表明,这些条件取决于器件的温度,半导体的相对介电常数,和有效的态密度,但最重要的是被探测的半导体膜的厚度。这是根据以前的观察和类似的推导表达式时,缺陷影响单载波器件。本文所述的条件可用于帮助设计用于不受注入限制的空间电荷限制电流测量的单载流子器件。

英文摘要:

By considering the changes in the interface charge-carrier densities of a single-carrier device as a function of injection-barrier heights and comparing these to the equilibrium, background charge-carrier density of a device with Ohmic contacts, we calculate simple conditions for when these barriers are expected to limit injection and therefore significantly affect space-charge-limited currents in the device. We show that these conditions depend on the device temperature, semiconductor relative permittivity, and effective density of states, but most importantly the thickness of the semiconducting film being probed. This is in accordance with previous observations and similar derived expressions for when defects influence single-carrier devices. The conditions described herein can be used to aid the design of single-carrier devices for space-charge-limited current measurements that are not limited by injection.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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