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arXiv 2109.02782cond-mat.mtrl-sci
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与Ge晶格匹配的Si-$_{x}$-Ge $_{1-x-y}$-Sn $_{y}$合金的电子和光学性质

Electronic and optical properties of Si$_{x}$Ge$_{1-x-y}$Sn$_{y}$ alloys lattice-matched to Ge

Phoebe M. Pearce, Christopher A. Broderick, Michael P. Nielsen, Andrew D. Johnson, Nicholas J. Ekins-Daukes

摘要:

我们提出了一个结合的实验和理论分析的近带隙的电子和光学性质的演变Si $_{x}$ Ge $_{1-x-y}$ Sn $_{y}$合金晶格匹配的Ge和GaAs衬底。我们进行光反射(PR)和光致发光(PL)的测量Si $_{x}$ Ge $_{1-x-y}$ Sn $_{y}$外延层通过化学气相沉积,Si(Sn)的成分高达$x =$ 9.6%($y =$ 2.5%)。我们的测量结果表明存在一个间接的基本带隙,PL观察到$\approx$ 200-250毫电子伏的能量低于直接$E_0$过渡PR测量确定。测得的PL是Ge样的,这表明合金导带(CB)的边缘主要来自Ge的L点CB最小值。PR和PL测量的解释支持原子电子结构计算。通过密度泛函理论计算的有效合金能带结构证实了间接的基本带隙的存在,并揭示了所观察到的不均匀加宽的测量光谱的起源是合金诱导的能带杂化发生在能量接近CB边缘。为了分析带隙的演化,采用半经验紧束缚(TB)计算来实现大的超晶胞尺寸的计算。TB的计算表明,合金CB边缘是杂化的性质,在低Si和Sn组成的混合物的Ge L-,$Γ$ -和X-点CB边缘状态,并确认合金CB边缘保留主要的Ge L-点CB边缘字符。我们的实验测量和理论计算证实了Si和Sn组分$x =$ 6.8 - 9.6%和$y =$ 1.6 - 2.2%的直接跃迁能量接近1 eV。

英文摘要:

We present a combined experimental and theoretical analysis of the evolution of the near-band gap electronic and optical properties of Si$_{x}$Ge$_{1-x-y}$Sn$_{y}$ alloys lattice-matched to Ge and GaAs substrates. We perform photoreflectance (PR) and photoluminescence (PL) measurements on Si$_{x}$Ge$_{1-x-y}$Sn$_{y}$ epitaxial layers grown via chemical vapour deposition, for Si (Sn) compositions up to $x =$ 9.6% ($y =$ 2.5%). Our measurements indicate the presence of an indirect fundamental band gap, with PL observed $\approx$ 200-250 meV lower in energy than the direct $E_0$ transition identified by PR measurements. The measured PL is Ge-like, suggesting that the alloy conduction band (CB) edge is primarily derived from the Ge L-point CB minimum. Interpretation of the PR and PL measurements is supported by atomistic electronic structure calculations. Effective alloy band structures calculated via density functional theory confirm the presence of an indirect fundamental band gap, and reveal the origin of the observed inhomogeneous broadening of the measured optical spectra as being alloy-induced band hybridisation occurring close in energy to the CB edge. To analyze the evolution of the band gap, semi-empirical tight-binding (TB) calculations are employed to enable calculations for large supercell sizes. TB calculations reveal that the alloy CB edge is hybridized in nature, consisting at low Si and Sn compositions of an admixture of Ge L-, $Γ$- and X-point CB edge states, and confirm that the alloy CB edge retains primarily Ge L-point CB edge character. Our experimental measurements and theoretical calculations confirm a direct transition energy close to 1 eV in magnitude for Si and Sn compositions $x =$ 6.8 - 9.6% and $y =$ 1.6 - 2.2%.

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