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arXiv 2103.15867cond-mat.mtrl-sci
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离子合成SiO2/Si结构中9 R-Si夹杂的光致发光:辐照剂量和氧化膜厚度的影响

Photoluminescence of ion-synthesized 9R-Si inclusions in SiO2/Si structure: effect of irradiation dose and oxide film thickness

Alena Nikolskaya, Alexey Belov, Alexey Mikhaylov, Anton Konakov, David Tetelbaum, Dmitry Korolev

摘要:

与传统的立方相硅相比,六方硅多型体的研究因其独特的物理性质而受到特别的关注。因此,对于一些六方相,已经证明了发射特性的显著改善。本文系统地研究了不同剂量Kr+离子辐照SiO2/Si结构并在800 °C退火后的发光特性。对于这样的结构,在~ 1240 nm处观察到光致发光线,并与六方9 R-Si相夹杂物的形成相关联。研究发现,氧化膜厚度的变化以及离子分布轮廓与膜/基界面的相对位置的变化导致发光强度的规律性变化。所观察到的依赖关系的性质进行了讨论,与所需的3C-Si -> 9 R-Si结构转变和非辐射缺陷的产生之间的相互作用。实验结果表明,离子辐照条件有利于类金刚石硅中光学活性9 R-Si相的合成。

英文摘要:

The study of hexagonal silicon polytypes attracts special attention due to their unique physical properties compared to the traditional cubic phase of Si. Thus, for some hexagonal phases, a significant improvement in the emission properties has been demonstrated. In this work, the luminescent properties of SiO2/Si structures irradiated with Kr+ ions at different doses and annealed at 800 °C have been systematically investigated. For such structures, a photoluminescence line at ~ 1240 nm is observed and associated with the formation of hexagonal 9R-Si phase inclusions. It is found that the variation in the thickness of oxide film and the relative position of ion distribution profile and film / substrate interface leads to a regular change in the luminescence intensity. The nature of the observed dependencies is discussed as related to the interplay between the desirable 3C-Si -> 9R-Si structural transition and generation of nonradiative defects. The revealed regularities suggest optimal ion irradiation conditions for synthesis of optically active 9R-Si phase in diamond-like silicon.

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