Thermal and Oxidation Stability of Ti$_x$W$_{1-x}$ Diffusion Barriers Investigated by Soft and Hard X-ray Photoelectron Spectroscopy
Curran Kalha, Sebastian Bichelmaier, Nathalie K. Fernando, Judith. V. Berens, Pardeep K. Thakur, Tien-Lin Lee, Julio. J. Gutiérrez-Moreno, Stephan Mohr, Laura E… 展开作者
Curran Kalha, Sebastian Bichelmaier, Nathalie K. Fernando, Judith. V. Berens, Pardeep K. Thakur, Tien-Lin Lee, Julio. J. Gutiérrez-Moreno, Stephan Mohr, Laura E. Ratcliff, Michael Reisinger, Johannes Zechner, Michael Nelhiebel, Anna Regoutz
The binary alloy of titanium-tungsten (TiW) is an established diffusion barrier in high-power semiconductor devices, owing to its ability to suppress the diffusion of copper from the metallisation scheme into the surrounding silicon substructure. However, little is known about the response of TiW to high temperature events or its behaviour when exposed to air. Here, a combined soft and hard X-ray photoelectron spectroscopy (XPS) characterisation approach is used to study the influence of post-deposition annealing and titanium concentration on the oxidation behaviour of a 300~nm-thick TiW film. The combination of both XPS techniques allows for the assessment of the chemical state and elemental composition across the surface and bulk of the TiW layer. The findings show that in response to high-temperature annealing, titanium segregates out of the mixed metal system and upwardly migrates, accumulating at the TiW/air interface. Titanium shows remarkably rapid diffusion under relatively short annealing timescales and the extent of titanium surface enrichment is increased through longer annealing periods or by increasing the precursor titanium concentration. Surface titanium enrichment enhances the extent of oxidation both at the surface and in the bulk of the alloy due to the strong gettering ability of titanium. Quantification of the soft X-ray photoelectron spectra highlights the formation of three tungsten oxidation environments, attributed to WO$_2$, WO$_3$ and a WO$_3$ oxide coordinated with a titanium environment. This combinatorial characterisation approach provides valuable insights into the thermal and oxidation stability of TiW alloys from two depth perspectives, aiding the development of future device technologies.
The Langmuir-Hinshelwood barrier (ELH) and the pre-exponential factor ($ν$LH) for CO oxidation have been measured at high temperature on hexagonal arrays of Pd clusters supported on an ultrathin alumina film on Ni3Al(111). The Pd clusters have a sharp size distribution and the mean sizes are: 174$\pm$13, 360$\pm$19 and 768$\pm$28 atoms. ELH and $ν$LH are determined from the initial reaction rate of a CO molecular beam with a saturation layer of adsorbed oxygen on the Pd clusters, measured at different temperatures (493$\le$T (K) $\le$613). The largest particles (3.5 nm) give values of ELH and …
$\textit{Ab initio}$ calculations were employed to investigate the effect of oxygen concentration dependent Ti vacancies formation on the core electron binding energy shifts in cubic titanium oxynitride (Ti$_{1-δ}$O$_x$N$_{1-x}$). It was shown, that the presence of a Ti vacancy reduces the 1s core electron binding energy of the first N neighbors by $\sim$0.6 eV and that this effect is additive with respect to the number of vacancies. Hence it is predicted that the Ti vacancy concentration can be revealed from the intensity of the shifted components in the N 1s core spectra region. This notion …
Using density functional theory and an exchange-correlationfunctional that includes the van der Waals interaction, we study the coadsorption of CO on Ru(0001) saturated with 0.5 ML of oxygen. Different coexisting CO coverages are considered that are experimentally motivated, the room temperaturecoverage consisting of 0.5 ML-O + 0.25 ML-CO (low coverage), the saturation coverage achieved at low temperatures (0.5 ML-O + 0.375 ML-CO, intermediate coverage), and the equally mixed monolayer that is stable according to our calculations but not experimentally observed yet (0.5 ML-O + 0.5 ML-CO, high …
Transient Surface Oxides Form on Pt(111) - But Vanish During Ammonia Oxidation
Synchrotron SOLEIL（SOLEIL同步辐射中心）；Université Grenoble Alpes, CEA Grenoble, IRIG, MEM, NRX（格勒诺布尔阿尔卑斯大学，CEA格勒诺布尔，IRIG，MEM，NRX）；Laboratoire Matériaux et Phénomènes Quantiques, Université Paris Cité, CNRS（材料与量子现象实验室，巴黎西岱大学，法国国家科学研究中心）；European Synchrotron Research Facility（欧洲同步辐射装置）
Oxidation-resilient structural modifications in Nickel-functionalized 3D-graphene for hydrogen storage applications
Istituto Nanoscienze–CNR（意大利国家研究委员会纳米科学研究所）；NEST-Scuola Normale Superiore（新实验科学与技术学院-高等师范学校）；Department of Physical Science, Earth, and Environment, University of Siena（锡耶纳大学地球与环境物理科学系）；Institute of Sensor and Actuator Systems, TU Wien（维也纳工业大学传感器与致动器系统研究所）；CNR - Istituto Officina dei Materiali (IOM)（意大利国家研究委员会材料工厂研究所）
Interdiffusion phenomena between adjacent materials are highly prevalent in semiconductor device architectures and can present a major reliability challenge for the industry. To fully capture and better understand these phenomena, experimental approaches must go beyond static and post-mortem studies to include in-situ and in-operando setups. Here, soft and hard X-ray photoelectron spectroscopy (SXPS and HAXPES) is used to monitor diffusion in real-time across a proxy device. The device consists of a Si/SiO\textsubscript{2}/Ti$_x$W$_{1-x}$(300 nm)/Cu(25 nm) thin film material stack, with the Ti…
Fabrication and Structural Analysis of Trilayers for Tantalum Josephson Junctions with Ta$_2$O$_5$ Barriers
University of Washington（华盛顿大学）；Colorado School of Mines（科罗拉多矿业学院）；National Laboratory of the Rockies（落基山国家实验室）；Pacific Northwest National Laboratory（太平洋西北国家实验室）；Rigetti Computing, Inc.（里盖蒂计算公司）
Owing to their high surface area, their high stability, and their hydrophobicity, periodic mesoporous organosilica (PMO) materials represent promising catalytic support for environmentally friendly chemical processes in water. We investigate here how the calcination of PMO material with benzene linkers (PMOB) allows its functionalization. Conventional and dynamic nuclear polarization (DNP)-enhanced NMR spectroscopy, diffuse reflectance infrared Fourier transform spectroscopy, and X-ray photoelectron spectroscopy prove that calcination at 450 °C results in the oxidation of phenylene bridges int…
Surface Van Hove singularity (SVHS), defined as the surface states near the Fermi level (EF) in low-dimensional systems, triggers exciting physical phenomena distinct from bulk. We herein explore theoretically the potential role of SVHS in catalysis taking CO oxidation reaction as prototype over graphene/Ca2N (Gra/Ca2N) heterojunction and Pt2HgSe3 (001) surface. It is demonstrated that both systems with SVHS could serve as an electron bath to promote O2 adsorption and subsequent CO oxidation with low energy barriers of 0.2 ~ 0.6 eV for Gra/Ca2N and Pt2HgSe3 (001) surface. Importantly, the cata…
Role of Oxygen during Methane Oxidation on Pd$_1$/PdO$_1$@CeO$_2$ Surface: A Combined Density Functional Theory, Microkinetic, and Machine Learning Approach
The epitaxial-graphene/graphene-oxide junction, an essential step towards epitaxial graphene electronics
已经沉积氧化石墨烯（GO）薄片以桥接两个外延石墨烯电极之间的间隙以产生全石墨烯装置。电学测量表明，由于GO中的带隙，在石墨烯/氧化石墨烯结处存在肖特基势垒（SB）。发现势垒高度约为0.7 eV，并且在180 $^\circ$ C退火后降低，这意味着可以通过改变氧化程度来调节间隙。发现GO迁移率的下限为850 cm $^2$ /Vs，与硅相当。已经实现了图案化外延石墨烯的{ \it In situ}局部氧化。
Silicon together with its native oxide SiO$_2$ was recognized as an outstanding material system for the semiconductor industry in the 1950s. In state-of-the-art device technology, SiO$_2$ is widely used as an insulator in combination with high-$k$ dielectrics such as HfO$_2$, demanding fabrication of ultra-thin interfacial layers. The classical standard model derived by Deal and Grove accurately describes the oxidation of Si in a progressed stage, however, strongly underestimates growth rates for thin oxide layers. Recent studies report a variety of oxidation mechanisms during the growth of ox…
Usually the ions of a particular element in solids are in positive or negative oxidation states, depending upon the chemical environment. It is highly unusual for an atom having both positive as well as negative oxidation states simultaneously within the same structural framework in a particular compound. Our structural and chemical bonding analyses show that the hydrogen ions in the transition metal ammine borohydrides (TMABHs) with the chemical formula M(BH4)2(NH3)2 (M = Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu and Zn) have both positive and negative oxidation states. Our detailed analyses confirm …
