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arXiv 0903.2377cond-mat.mtrl-scicond-mat.str-el
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Fe3O4/GaAs薄膜界面的硬X射线光电子能谱学研究

Probing the interface of Fe3O4/GaAs thin films by hard x-ray photoelectron spectroscopy

M. Paul, A. Mueller, A. Ruff, B. Schmid, G. Berner, M. Mertin, M. Sing, R. Claessen

摘要:

用HArd X射线光电子能谱学(HAXPES)和低能电子衍射研究了GaAs衬底上的Fe_3O_4薄膜。在不同的生长条件下制备的薄膜进行比较,相对于化学计量,氧化,和化学性质。与传统的X射线光电子能谱学(XPS)相比,采用HAXPES的探测深度大大增强,使我们能够研究膜-基底界面的化学状态。在界面处的氧化和混合的程度取决于所施加的生长条件;特别地,我们发现金属Fe、As 2 O3和Ga 2 O3存在于界面处。这些界面相可能不利于从磁铁矿到GaAs的自旋注入。

英文摘要:

Magnetite (Fe3O4) thin films on GaAs have been studied with HArd X-ray PhotoElectron Spectroscopy (HAXPES) and low-energy electron diffraction. Films prepared under different growth conditions are compared with respect to stoichiometry, oxidation, and chemical nature. Employing the considerably enhanced probing depth of HAXPES as compared to conventional x-ray photoelectron spectroscopy (XPS) allows us to investigate the chemical state of the film-substrate interfaces. The degree of oxidation and intermixing at the interface are dependent on the applied growth conditions; in particular, we found that metallic Fe, As2O3, and Ga2O3 exist at the interface. These interface phases might be detrimental for spin injection from magnetite into GaAs.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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