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arXiv 2101.09185cond-mat.mtrl-sci
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4f电子掺杂Y1-x(Dy)xPdBi拓扑半金属薄膜的结构和输运性质

Structural and transport properties of 4f electron doped Y1-x(Dy)xPdBi topological semi-metallic thin films

Vishal Bhardwaj, Niladri Banerjee, Ashok K. Ganguli, Ratnamala Chatterjee

摘要:

研究了4f电子掺杂对脉冲激光沉积法制备的Dy掺杂半Heusler Y1-x(Dy)xPdBi(x =0,0.2,0.5,1)薄膜的结构、电学和磁输运性质的影响。Dy掺杂导致晶格收缩,随着Dy掺杂的增加,晶格收缩从母体x =0样品的0%增加到x=1样品的约1.3%。电输运测量表明,在3 K至300 K的温度范围内的典型的半金属行为和电阻率急剧下降,在低温(小于3 K)的所有样品。高磁场下的磁输运测量和Shubnikov de-Hass振荡表明,对于这些拓扑非平凡的样品,Dy掺杂诱导的晶格收缩在修改费米面、载流子浓度和有效电子质量方面起着积极的作用。有一个统一的抑制超导性的发病与增加Dy掺杂,这可能是有关的增加本地交换场所产生的4f电子在Dy。结果表明,通过f电子掺杂可以调节YPdBi的能带结构参数,应变薄膜Y1-x(Dy)xPdBi在低温下表现出表面主导的相对论载流子输运.

英文摘要:

We report the effect of 4f electron doping on structural, electrical and magneto-transport properties of Dy doped half Heusler Y1-x(Dy)xPdBi (x =0, 0.2, 0.5, 1) thin films grown by pulsed laser deposition. The Dy doping leads to lattice contraction which increases from 0% for the parent x =0 sample to approx 1.3% for x=1 sample with increase in Dy doping. The electrical transport measurements show a typical semi-metallic behaviour in the temperature range 3K to 300K and a sharp drop in resistivity at low temperatures (less than 3K) for all the samples. Magnetotransport measurements and Shubnikov de-Hass oscillations at high magnetic fields demonstrate that for these topologically non-trivial samples, Dy doping induced lattice contraction plays an active role in modifying the Fermi surface, carrier concentration and the effective electron mass. There is an uniform suppression of the onset of superconductivity with increased Dy doping which is possibly related to the increasing local exchange field arising from the 4f electrons in Dy. Our results indicate that we can tune various band structure parameters of YPdBi by f electron doping and strained thin films of Y1-x(Dy)xPdBi show surface dominated relativistic carrier transport at low temperatures.

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