arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2012.04607astro-ph.IM
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迈向高性能软X射线临界角透射光栅的量产

Toward volume manufacturing of high-performance soft x-ray critical-angle transmission gratings

Ralf K. Heilmann, Alexander R. Bruccoleri, Jungki Song, Matthew T. Cook, James A. Gregory, Renee D. Lambert, Dimitri A. Shapiro, Douglas J. Young, Miranda Brads… 展开作者

Ralf K. Heilmann, Alexander R. Bruccoleri, Jungki Song, Matthew T. Cook, James A. Gregory, Renee D. Lambert, Dimitri A. Shapiro, Douglas J. Young, Miranda Bradshaw, Vadim Burwitz, Gisela D. Hartner, Andreas Langmeier, Randall K. Smith, Mark L. Schattenburg

AI总结:

本文针对Arcus和Lynx等X射线光谱任务对大量高性能软X射线光栅的需求,开发了基于200 mm晶圆工具的大幅面批量制造工艺,并通过电子束掩模投影光刻与深硅刻蚀技术提升CAT光栅的衍射效率和分辨率。

摘要:

在软X射线波段进行高分辨率($R = λ/Δλ > 2000$)的X射线吸收和发射线光谱观测,是探索宇宙网、星系团、星系晕、星系际空间以及恒星大气中普遍存在的温热等离子体性质及其动力学过程的关键诊断手段。利用临界角透射(CAT)光栅,已经实现了$R > 10{,}000$的软X射线光栅光谱观测。CAT光栅兼具透射光栅对准和温度容差宽松、质量轻的优点,以及在高衍射级次上闪耀的高衍射效率。它们是拟议中的Arcus光栅探测器的一项使能技术,并被选用于Lynx设计参考任务的光栅光谱仪载荷。Arcus和Lynx都需要制造数百到约$\approx 2000$块大面积CAT光栅。我们正在开发新的图形化和制造工艺流程,以适应在先进的200 mm晶圆设备上进行大幅面批量加工。最近对周期为200 nm的光栅进行的X射线测试表明,利用电子束写入掩模和4倍投影光刻并结合硅孔聚焦光学系统,在1.49 keV处实现了$R \approx 10^4$的分辨率。将光栅深度从4 $μ$m扩展到6 $μ$m预计将显著提高衍射效率,这是我们当前结合深反应离子刻蚀和KOH溶液湿法刻蚀开展的工作的一部分。我们介绍了近期在光栅制造方面的进展,并报告了最新的衍射效率和建模结果。

英文摘要:

High-resolution ($R = λ/Δλ> 2000$) x-ray absorption and emission line spectroscopy in the soft x-ray band is a crucial diagnostic for the exploration of the properties of ubiquitous warm and hot plasmas and their dynamics in the cosmic web, galaxy clusters, galaxy halos, intragalactic space, and star atmospheres. Soft x-ray grating spectroscopy with $R > 10{,}000$ has been demonstrated with critical-angle transmission (CAT) gratings. CAT gratings combine the relaxed alignment and temperature tolerances and low mass of transmission gratings with high diffraction efficiency blazed in high orders. They are an enabling technology for the proposed Arcus grating explorer and were selected for the Lynx design reference mission grating spectrometer instrument. Both Arcus and Lynx require the manufacture of hundreds to perhaps $\approx 2000$ large-area CAT gratings. We are developing new patterning and fabrication process sequences that are conducive to large-format volume processing on state-of-the-art 200 mm wafer tools. Recent x-ray tests on 200 nm-period gratings patterned using e-beam-written masks and 4x projection lithography in conjunction with silicon pore focusing optics demonstrated $R \approx 10^4$ at 1.49 keV. Extending the grating depth from 4 $μ$m to 6 $μ$m is predicted to lead to significant improvements in diffraction efficiency and is part of our current efforts using a combination of deep reactive-ion etching and wet etching in KOH solution. We describe our recent progress in grating fabrication and report our latest diffraction efficiency and modeling results.

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