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arXiv 2003.06449astro-ph.IM
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热激活选择性形貌平衡法制备闪耀反射光栅的极紫外和软X射线衍射效率

Extreme Ultraviolet and Soft X-Ray Diffraction Efficiency of a Blazed Reflection Grating Fabricated by Thermally Activated Selective Topography Equilibration

Jake A. McCoy, Randall L. McEntaffer, Drew M. Miles

摘要:

利用反射光栅光谱仪进行极紫外(EUV)和软X射线(SXR)光谱分析的未来天文台需要具有闪耀凹槽刻面和定制凹槽布局的高保真度光栅,这些凹槽通常是扇形的或具有轻微的曲率。虽然以单晶硅中的湿法各向异性蚀刻为中心的制造过程产生高效的闪耀光栅,但非平行凹槽布局的精度受到硅晶体的立方结构的限制。这激发了对光栅制造的替代技术的追求,即热激活选择性形貌平衡(TASTE),其使用灰度级电子束光刻来图案化抗蚀剂中的多级结构,然后通过优化的聚合物热回流来使3D图案平滑成连续的表面浮雕轮廓。使用TASTE,在硅衬底上的130 nm厚的聚(甲基丙烯酸甲酯)抗蚀剂中在50 mm × 7.5 mm的区域上图案化用于具有400 nm周期性和类似于不对称光栅的凹槽的反射光栅的模具。该结构通过使用钛作为粘附层的电子束物理气相沉积涂覆有15nm的金,然后在高级光源同步加速器设施的光束线6.3.2处测试EUV和SXR衍射效率。结果表明,一个准闪耀响应特性的27度闪耀角与槽面平滑到1.5 nm均方根。绝对峰阶效率范围从75%到25%,而总的相对效率在15.5 nm > lambda > 1.55 nm的测量带通上测量到90%的差距。

英文摘要:

Future observatories utilizing reflection grating spectrometers for extreme ultraviolet (EUV) and soft X-ray (SXR) spectroscopy require high-fidelity gratings with both blazed groove facets and custom groove layouts that are often fanned or feature a slight curvature. While fabrication procedures centering on wet anisotropic etching in monocrystalline silicon produce highly efficient blazed gratings, the precision of a nonparallel groove layout is limited by the cubic structure of the silicon crystal. This motivates the pursuit of alternative techniques to grating manufacture, namely thermally activated selective topography equilibration (TASTE), which uses gray-scale electron-beam lithography to pattern multilevel structures in resist followed by an optimized polymer thermal reflow to smooth the 3D patterns into continuous surface relief profiles. Using TASTE, a mold for a reflection grating with a periodicity of 400 nm and grooves resembling an asymmetric sawtooth was patterned in 130 nm thick poly(methyl methacrylate) resist on a silicon substrate over a 50 mm by 7.5 mm area. This structure was coated with 15 nm of gold by electron-beam physical vapor deposition using titanium as an adhesion layer and then tested for EUV and SXR diffraction efficiency at beamline 6.3.2 of the Advanced Light Source synchrotron facility. Results demonstrate a quasi-blaze response characteristic of a 27 degree blaze angle with groove facets smooth to 1.5 nm rms. Absolute peak-order efficiency ranges from 75% to 25%, while total relative efficiency measures gap90% across the measured bandpass of 15.5 nm > lambda > 1.55 nm.

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