arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2009.01111cond-mat.mtrl-sci
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硅金属晶格的扫描透射电子层析和电子能量损失谱

Scanning Transmission Electron Tomography and Electron Energy Loss Spectroscopy of Silicon Metalattices

Shih-Ying Yu, Hiu Yan Cheng, Jennifer L. Dysart, ZhaoHui Huang, Ke Wang, Thomas E. Mallouk, Vincent H. Crespi, John V. Badding, Suzanne E. Mohney

摘要:

透射电子显微镜,扫描透射电子断层扫描,电子能量损失谱被用来表征三维人工硅纳米结构称为“金属晶格”,专注于硅金属晶格合成的高压限制化学气相沉积在30纳米胶体二氧化硅模板与~7和~12纳米的“元原子”和~2纳米的“元键”。“元原子”紧密地复制了面进入的立方胶体二氧化硅模板的四面体和八面体间隙位点的形状。由非晶或纳米晶硅组成的金属晶格在二维显微照片和三维重建中表现出长程序和互连性。电子能量损失谱提供了局部电子结构的信息。Si L2,3芯损耗边缘与体Si的起始相比蓝移,其中间位键显示出比两种类型的间位原子(0.30和0.17 eV)更大的位移(0.55 eV)。局域态密度的计算使用经验紧束缚方法是在合理的协议。

英文摘要:

Transmission electron microscopy, scanning transmission electron tomography, and electron energy loss spectroscopy were used to characterize three-dimensional artificial Si nanostructures called "metalattices", focusing on Si metalattices synthesized by high-pressure confined chemical vapor deposition in 30-nm colloidal silica templates with ~7 and ~12 nm "meta-atoms" and ~2 nm "meta-bonds". The "meta-atoms" closely replicate the shape of the tetrahedral and octahedral interstitial sites of the face-entered cubic colloidal silica template. Composed of either amorphous or nanocrystalline silicon, the metalattice exhibits long-range order and interconnectivity in two-dimensional micrographs and three-dimensional reconstructions. Electron energy loss spectroscopy provides information on local electronic structure. The Si L2,3 core-loss edge is blue-shifted compared to the onset for bulk Si, with the meta-bonds displaying a larger shift (0.55 eV) than the two types of meta-atoms (0.30 and 0.17 eV). Local density of state calculations using an empirical tight binding method are in reasonable agreement.

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