arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2006.14714cond-mat.mtrl-sci
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薄膜生长对熵稳定氧化物电导率的影响

Thin Film Growth Effects on Electrical Conductivity in Entropy Stabilized Oxides

Valerie Jacobson, Dave Diercks, Bobby To, Andriy Zakutayev, Geoff Brennecka

摘要:

熵稳定化作为一种新的材料设计方法受到了广泛的关注。这一领域的大部分工作都集中在块体陶瓷加工上,而熵稳定薄膜的研究相对较少。多晶(Mg $_{0.2}$ Co $_{0.2}$ Ni $_{0.2}$ Cu $_{0.2}$ Zn $_{0.2}$)O薄膜通过脉冲激光沉积(PLD)沉积的广泛的多变量调查后,在这里示出,衬底温度和沉积压力对膜织构和晶格参数具有强烈的和可重复的影响。进一步的分析表明,在较低温度和较低氧室压力下沉积的膜的导电性比在较高温度和压力下生长的其他相同膜高$\sim$ 40倍。这种电子电导率被假设为是由过渡金属价态变化介导的极化子跳跃的结果,该过渡金属价态变化补偿了氧的非化学计量。

英文摘要:

Entropy stabilization has garnered significant attention as a new approach to designing novel materials. Much of the work in this area has focused on bulk ceramic processing, leaving entropy-stabilized thin films relatively underexplored. Following an extensive multi-variable investigation of polycrystalline (Mg$_{0.2}$Co$_{0.2}$Ni$_{0.2}$Cu$_{0.2}$Zn$_{0.2}$)O thin films deposited via pulsed laser deposition (PLD), it is shown here that substrate temperature and deposition pressure have strong and repeatable effects on film texture and lattice parameter. Further analysis shows that films deposited at lower temperatures and under lower oxygen chamber pressure are $\sim$40x more electrically conductive than otherwise identical films grown at higher temperature and pressure. This electronic conductivity is hypothesized to be the result of polaron hopping mediated by transition metal valence changes which compensate for oxygen off-stoichiometry.

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