arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2006.02128cond-mat.mtrl-sci
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带电缺陷计算中的像电荷相互作用修正

Image charge interaction correction in charged-defect calculation

Zhao-Jun Suo, Jun-Wei Luo, Shu-Shen Li, Lin-Wang Wang

摘要:

利用周期性超原胞计算荷电缺陷是固体物理中的一类重要问题。然而,有限的超晶胞尺寸引起不期望的长程镜像电荷库仑相互作用。虽然已经提出了各种方法来消除这种图像库仑相互作用,大多数以前的计划是基于一个粗略的近似缺陷电荷屏蔽。在这项工作中,我们提出了一个严格的推导的图像电荷相互作用与一个新的缺陷屏蔽模型,可以避免使用体宏观介电常数。我们已经验证了这种方法与广泛使用的方法相比,12个不同的缺陷。我们的修正方案提供了一个更快的收敛速度有关的超晶胞大小的情况下,具有相当大的图像电荷相互作用。在这些情况下,我们还发现,非线性介电屏蔽可能起着重要的作用。提出的新的缺陷屏蔽模型也将揭示新的光理解缺陷屏蔽性能,并可以应用到其他缺陷系统。

英文摘要:

Charged-defect calculation using a periodic supercell is a significant class of problems in solid state physics. However, the finite supercell size induces an undesirable long-range image charge Coulomb interaction. Although a variety of methods have been proposed to eliminate such image Coulomb interaction, most of the previous schemes are based on a rough approximation of the defect charge screening. In this work, we present a rigorous derivation of the image charge interaction with a new defect screening model where the use of bulk macroscopic dielectric constant can be avoided. We have verified this approach in comparison with a widely used approach for 12 different defects. Our correction scheme offers a much faster convergence concerning the supercell size for cases with considerable image charge interactions. In those cases, we also found that the nonlinear dielectric screening might play an important role. The proposed new defect screening model will also shed new light on understanding the defect screening properties and can be applied to other defect systems.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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