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arXiv 2005.14103cond-mat.mtrl-sci
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硅中H $^-$热电子发射的第一性原理计算

First-principles calculations of thermal electron emission from H$^-$ in silicon

Yoshiyuki Yamamoto, Alpin Novianus Tatan, Osamu Sugino

摘要:

氢杂质的热电子发射过程是半导体基础物理的重要课题。尽管经过了几十年的研究,但理论尚未建立。在这里,我们研究的过程中的$\mathrm{H}^{-}$硅,$\mathrm{H^{-}} \to \mathrm{H^{0}} + e^{-}$,使用第一性原理计算。计算结果表明,该过程由两个步骤组成:H $^{-}$从四面体位置向键心位置的缓慢扩散,这是速率限制步骤; $\mathrm{H}^{-}$向$\mathrm{H}^{0} + e^{-}$的快速无辐射跃迁,随后发生在体心位置.计算结果与深能级瞬态谱实验结果一致

英文摘要:

Thermal electron emission process of a hydrogen impurity is an important topic of fundamental semiconductor physics. Despite of decades-long study, theory is not established yet. Here, we study the process of $\mathrm{H}^{-}$ in silicon, $\mathrm{H^{-}} \to \mathrm{H^{0}} + e^{-}$, using a first-principles calculation. Our calculation indicates that the process consists of two steps: slow diffusion of H$^{-}$ from a tetrahedral site to a bond-center site, which is the rate-limiting step, and faster nonradiative transition from $\mathrm{H}^{-}$ to $\mathrm{H}^{0} + e^{-}$ that occurs subsequently at the body-center site. The calculated rate is consistent with a deep level transient spectroscopy experiment

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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