Transition metal nitrides have received significant interest for use within plasmonic and optoelectronic devices. However, deposition temperature remains a significant barrier to the integration of transition metal nitrides as plasmonic materials within CMOS fabrication processes. Binary, ternary and layered transition metal nitride thin films based on titanium and niobium nitride are deposited using High Power Impulse Magnetron Sputtering (HIPIMS). The increased plasma densities achieved in the HIPIMS process allow high quality plasmonic thin films to be deposited at CMOS compatible temperatures of less than 300°C. Thin films are deposited on a range of industrially relevant substrates and display tunable plasma frequencies in the ultraviolet to visible spectral ranges. The thin film quality, combined with the scalability of the deposition process, indicates that HIPIMS deposition of nitride films is an industrially viable technique and can pave the way towards the fabrication of next generation plasmonic and optoelectronic devices.
200 mm Wafer-Scale Monolithic 3D Integration of Atomic Layer-Deposited Oxide Semiconductors
Elmore Family School of Electrical and Computer Engineering, Purdue University（普渡大学埃尔莫电气与计算机工程学院）；Birck Nanotechnology Center, Purdue University（普渡大学伯克纳米技术中心）；School of Materials Science and Engineering, Purdue University（普渡大学材料科学与工程学）
Graphene has emerged as an ultrafast optoelectronic material for on-chip photodetector applications. The 2D nature of graphene enables its facile integration with complementary metal-oxide semiconductor (CMOS) microelectronics and silicon photonics, yet graphene absorbs only $\sim$2.3% of light. Plasmonic metals can enhance the responsivity of graphene photodetectors, but may result in CMOS-incompatible devices, depending on the choice of metal. Here, we propose a plasmon-enhanced photothermoelectric graphene detector using CMOS-compatible titanium nitride (TiN) on the silicon-on-insulator (SO…
Traditional computation based on von Neumann architecture is limited by the time and energy consumption due to data transfer between the storage and the processing units. The von Neumann architecture is also inefficient in solving unstructured, probabilistic, and real-time problems. To address these challenges, a new brain-inspired neuromorphic computational architecture is required. Due to absence of resistance-capacitance (RC) delay, high bandwidth and low power consumption, optoelectronic artificial synaptic devices are highly attractive. Yet stable, scalable, and complementary-metal-oxide-…
Optical constants of DC sputtering derived ITO, TiO2 and TiO2:Nb thin films characterized by spectrophotometry and spectroscopic ellipsometry for optoelectronic devices
Refractory materials exhibit high damage tolerance, which is attractive for the creation of nanoscale field-emission electronics and optoelectronics applications that require operation at high peak current densities and optical intensities. Recent results have demonstrated that the optical properties of titanium nitride, a refractory and CMOS-compatible plasmonic material, can be tuned by adding silicon and oxygen dopants. However, to fully leverage the potential of titanium (silicon oxy)nitride, a reliable and scalable fabrication process with few-nm precision is needed. In this work, we deve…
Monatomic antimony thin films have recently attracted attention for applications in phase change memory, nanophotonics, and 2D materials. Although some promising results have been reported, the true potential of Sb thin films is still hindered by the scalability issue and the lack of reliable bottom-up production. Here we demonstrate the growth of Sb thin films on a lattice-matching and amorphous substrates using pulsed laser deposition (PLD). C-axis out-of-plane textured Sb thin films were successfully deposited on Sb$_2$Te$_3$ and SiO$_2$\Si$_3$N$_4$ substrates. In the case of growth on Sb$_…
The electronic wavefunctions of an atom or molecule are affected by its interactions with its environment. These interactions dictate electronic and optical processes at interfaces, and is especially relevant in the case of thin film optoelectronic devices such as organic solar cells. In these devices, charge transport and interfaces between multiple layers occur along the thickness or vertical direction, and thus such electronic interactions are crucial in determining the device properties. Here, we introduce a new in-situ spectroscopic ellipsometry data analysis method called DART with the a…
Laser Annealing of Transparent ZnO Thin Films: A Route to Improve Electrical Conductivity and Oxygen Sensing Capabilities
Instituto de Nanociencia y Materiales de Aragón, CSIC-Universidad de Zaragoza（阿拉贡纳米科学与材料研究所，西班牙科学理事会-萨拉戈萨大学）；Univ. Grenoble Alpes, CNRS, Grenoble INP, LMGP（格勒诺布尔阿尔卑斯大学，法国国家科学研究中心，格勒诺布尔理工学院）
High-reflectance group III-nitride distributed Bragg reflectors (DBRs) were deposited by MOCVD on Si (111) substrates. A reflectance greater than 96% was demonstrated for the first time for an AlN/GaN DBR with a stop-band centered in the blue-green range of the visible spectrum. Crack-free GaN cap layers were grown on the DBR structures to demonstrate the opportunity to build III-nitride optoelectronic devices in this material. The DBR structure was under significant strain due to growth on a mismatched substrate although the GaN cap layer was shown to be strain free.
Many investigations and reviews show that II-VI compound semiconductor 1-D nanostructures have a great potential for the future electronic and optoelectronic applications. As an important II-VI semiconductor, ZnSe is one of the most significant materials with prominent applications in this issue. In the present work, we firstly provide a comprehensive investigation of the magnetic properties like magnetization and magnetic susceptibility of ZnSe nanostructures as a 1-D quantum many body. The magnetic study of this metal reveals a ferromagnetic-antifferomagnetic transition upon cooling. Magneti…
