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arXiv 2005.04359cond-mat.mtrl-sci
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Epitaxial Growth and Band Structure of Antiferromagnetic Mott Insulator CeOI

Xinqiang Cai, Zhilin Xu, Hui Zhou, Jun Ren, Na Li, Sheng Meng, Shuai-Hua Ji, Xi Chen

英文摘要:

The van der Waals material CeOI is predicted to be a layered antiferromagnetic Mott insulator by DFT+U calculation. We successfully grow the CeOI films down to monolayer on graphene/6H-SiC(0001) substrate by using molecular beam epitaxy. Films are studied by {\it in-situ} scanning tunneling microscopy and spectroscopy, which shows a band gap of 4.4 eV. A metallic phase with composition unidentified also exists. This rare earth oxyhalide adds a new member to the two-dimensional magnetic materials.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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