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arXiv 2004.02622cond-mat.mtrl-sciphysics.app-ph
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Atomic Layer Deposition of SiO$_2$-GeO$_2$ multilayers

Jordi Antoja-Lleonart, Silang Zhou, Kit de Hond, Gertjan Koster, Guus Rijnders, Beatriz Noheda

英文摘要:

Despite its interest for CMOS applications, Atomic Layer Deposition (ALD) of GeO$_{2}$ thin films, by itself or in combination with SiO$_{2}$, has not been widely investigated yet. Here we report the ALD growth of SiO$_{2}$/GeO$_{2}$ multilayers on Silicon substrates using a so far unreported Ge precursor. The characterization of multilayers with various periodicities reveals successful layer-by-layer growth with electron density contrast and absence of chemical intermixing, down to a periodicity of 2 atomic layers.

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