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arXiv 2004.01631cond-mat.mtrl-sci
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Bi$_2$Se$_3$拓扑绝缘体的氮气表面掺杂证据

Evidence for nitrogen gas surface doping of the Bi$_2$Se$_3$ topological insulator

Michael Gottschalk, Mal-Soon Lee, Eric Goodwin, Camille Mikolas, Thomas Chasapis, Duck Young Chung, Mercouri Kanatzidis, S. D. Mahanti, Stuart Tessmer

AI总结:

本文通过扫描隧道谱和密度泛函理论计算,证明氮气暴露可使Bi₂Se₃中N原子占据Se空位,消除缺陷态并使狄拉克点向费米能级移动约50 meV。

摘要:

利用扫描隧道谱,我们研究了氮气暴露对硒化铋态密度的影响。我们观察到狄拉克点的移动,这与氮结合到硒空位的理论建模在定性上一致。在仔细控制的测量中,Bi$_2$Se$_3$晶体最初在氦气环境中解理,然后暴露于22 SCFH流量的超高纯度N$_2$气体中。我们观察到谱线随之发生变化,暴露效应在大约50分钟后饱和,最终使狄拉克点向费米能级靠近约50 meV。这些结果与密度泛函理论计算进行了比较,计算结果支持这样一种图像:$N_2$分子物理吸附在Se空位附近,并解离成单个N原子,然后与Se空位强结合。在这种解释中,N原子结合到Se空位位置消除了由空位产生的表面缺陷态,并改变了费米能量相对于狄拉克点的位置。

英文摘要:

Using scanning tunneling spectroscopy we have studied the effects of nitrogen gas exposure on the bismuth selenide density of states. We observe a shift in the Dirac point which is qualitatively consistent with theoretical modeling of nitrogen binding to selenium vacancies. In carefully controlled measurements, Bi$_2$Se$_3$ crystals were initially cleaved in a helium gas environment and then exposed to a 22 SCFH flow of ultra-high purity N$_2$ gas. We observe a resulting change in the spectral curves, with the exposure effect saturating after approximately 50 minutes, ultimately bringing the Dirac point about 50 meV closer to the Fermi level. These results are compared to density functional theoretical calculations, which support a picture of $N_2$ molecules physisorbing near Se vacancies and dissociating into individual N atoms which then bind strongly to Se vacancies. In this interpretation, the binding of the N atom to a Se vacancy site removes the surface defect state created by the vacancy and changes the position of the Fermi energy with respect to the Dirac point.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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