arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 2003.08930cond-mat.mtrl-sciphysics.app-phphysics.chem-ph
收藏

合金薄膜定量X射线荧光分析中二次荧光激发的验证

Validation of secondary fluorescence excitation in quantitative X-ray fluorescence analysis of thin alloy films

André Wählisch, Cornelia Streeck, Philipp Hönicke, Burkhard Beckhoff

摘要:

X射线荧光(XRF)分析是一种广泛应用的用于定量分析高达$μ$ m尺度的薄膜的技术,因为其非破坏性性质并且因为其易于自动化。当要求分析结果的不确定度在几个百分比范围内时,多元素样品中的非线性二次荧光效应可能使原本简单的定量复杂化,因为它可以容易地超过20%的相对贡献。依赖于性能良好的参考样品的常规解决方案受到其低可用性的阻碍,特别是对于薄膜应用。为了解决这一挑战,我们展示了一种灵活的生产方法的多层,合金薄膜具有显着的二次荧光的贡献。我们使用无参考XRF分析来验证二次荧光物理模型的可靠性,其中包括彻底的不确定性估计。被调查的样品被鉴定为XRF或其他定量分析的校准样品。

英文摘要:

X-ray fluorescence (XRF) analysis is a widely applied technique for the quantitative analysis of thin films up to the $μ$m scale because of its non-destructive nature and because it is easily automated. When low uncertainties of the analytical results in the few percent range are required, the non-linear secondary fluorescence effect in multi-elemental samples may complicate an otherwise straightforward quantification, since it can easily exceed a relative contribution of 20%. The conventional solution, to rely on good performing reference samples, is hindered by their low availability, especially for thin film applications. To address this challenge, we demonstrate a flexible production method of multilayered, alloyed thin films with significant secondary fluorescence contributions. We use reference-free XRF analysis to validate the reliability of the physical model for secondary fluorescence, which includes a thorough uncertainty estimation. The investigated specimens are being qualified as calibration samples for XRF or other quantitative analyses.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑