arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2001.07980cond-mat.mtrl-scicond-mat.mes-hall
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IV族化合物半导体生长动力学的模拟

Simulation of the growth kinetics in group IV compound semiconductors

A. La Magna, A. Alberti, E. Barbagiovanni, C. Bongiorno, M. Cascio, I. Deretzis, F. La Via, E. Smecca

摘要:

我们提出了一种随机模拟方法,旨在研究在原子分辨率的sp3型键合对称性的化合物的生长动力学。针对3C-SiC材料的特定情况,讨论了形式化和实施细节。我们的数值工具的一个关键特征是能够模拟点状和扩展缺陷的演化,而原子动力学严重依赖于与工艺相关的参数。特别地,模拟可以描述晶体的表面状态和作为初始衬底条件和模拟参数的校准的函数的缺陷的产生/演变。我们表明,定量预测的微观结构演变的研究系统可以很容易地与实际加工样品的结构表征。

英文摘要:

We present a stochastic simulation method designed to study at an atomic resolution the growth kinetics of compounds characterized by the sp3-type bonding symmetry. Formalization and implementation details are discussed for the particular case of the 3C-SiC material. A key feature of our numerical tool is the ability to simulate the evolution of both point-like and extended defects, whereas atom kinetics depend critically on process-related parameters. In particular, the simulations can describe the surface state of the crystal and the generation/evolution of defects as a function of the initial substrate condition and the calibration of the simulation parameters. We demonstrate that quantitative predictions of the microstructural evolution of the studied systems can be readily compared with the structural characterization of actual processed samples.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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