arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 2001.03084cond-mat.mtrl-sci
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在Bi2Se3/Sb2Te3超短周期超晶格中具有增强的带隙和抑制的体导电的设计拓扑绝缘体

Designer topological insulator with enhanced gap and suppressed bulk conduction in Bi2Se3/Sb2Te3 ultra-short period superlattices

Ido Levy, Cody Youmans, Thor Garcia, Haiming Deng, Steven Alsheimer, Christophe Testelin, Lia Krusin-Elbaum, Pouyan Ghaemi, Maria Tamargo

摘要:

提出了一种利用两层交替拓扑绝缘体构成的短周期超晶格来降低体电导的新方法。超晶格能隙增强(SGE)的证据是从观察到的体背景掺杂的减少超过一个数量级获得的,从1.2 × 1020 cm-3到8.5 × 1018 cm-3,随着Bi 2Se 3/Sb 2 Te 3 SL的周期分别从12 nm减小到5 nm。紧束缚计算表明,在非常薄的周期制度,一个显着的SGE可以通过适当的材料选择实现。交替的Bi 2Se 3和Sb 2 Te 3层的BSL表现为具有比具有最大带隙的组成层的带隙大60%的体带隙的新设计者材料,同时保留拓扑表面特征。对生长的周期非常薄的SL样品的低温磁导中明显的弱反定域化(WAL)尖点的分析证实了SL结构的顶面和底面表现为狄拉克表面态。这种方法代表了一个有前途的,但仍有待探索的平台,用于建立真正的绝缘体TI。

英文摘要:

A novel approach to reduce bulk conductance by the use of short period superlattices (SL) of two alternating topological insulator layers is presented. Evidence for a superlattice gap enhancement (SGE) was obtained from the observed reduction of bulk background doping by more than one order of magnitude, from 1.2x1020 cm-3 to 8.5x1018 cm-3 as the period of Bi2Se3/Sb2Te3 SLs is decreased from 12 nm to 5 nm, respectively. Tight binding calculations show that in the very thin period regime, a significant SGE can be achieved by the appropriate choice of materials. The ultrathin SL of alternating Bi2Se3 and Sb2Te3 layers behaves as a new designer material with a bulk bandgap as much as 60% larger than the bandgap of the constituent layer with the largest bandgap, while retaining topological surface features. Analysis of the weak antilocalization (WAL) cusp evident in the low temperature magneto-conductance of a very thin period SL sample grown confirms that the top and bottom surfaces of the SL structure behave as Dirac surface states. This approach represents a promising and yet to be explored platform for building truly insulating bulk TIs.

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