超导铌上新型化学抛光酸铜催化剂的发现
Discovery Of Copper Catalyst For New Chemical Polishing Acid On Superconducting Niobium
摘要：
高场Q斜率（HFQS）严重限制了缓冲化学抛光（BCP）超导射频（SRF）铌腔的高梯度性能。其直接原因或机制尚未完全了解。在我们最近广泛的数据分析中，我们得出结论，潜在的根本原因可能是表面的氮污染。硝酸污染可能是在BCP期间由硝酸产生的，BCP使用氢氟酸、硝酸和磷酸的混合物。基于这一想法，我们开始开发一种新的化学抛光酸，用过氧化氢代替硝酸。我们已经发现，这种新的酸不能提供光滑的表面精整，然而添加铜催化剂允许这种酸提供类似于或甚至优于来自常规BCP的光滑表面。本文首先说明了解决HFQS的意义，然后总结了我们广泛的数据分析结果，最后描述了我们发现的铜催化剂。
英文摘要：
High field Q-slope (HFQS) seriously limits the high gradient performance of the buffered chemically polished (BCP) superconducting radio frequency (SRF) niobium cavities. The direct cause or mechanism is not yet fully understood. In our recent extensive data analysis, we concluded that the potential root cause could be nitrogen contamination on the surface. The nitric contamination could be created by nitric acid during BCP which uses the mixture of hydrofluoric acid, nitric acid, and phosphoric acid. Based on this thought, we started to develop a new chemical polishing acid that replaces the nitric acid by hydrogen peroxide. We have discovered that this new acid cannot provide smooth surface finishing, however adding copper catalyst allows this acid to provide a smooth surface similar to or even better than that from the conventional BCP. This paper first shows the significance of resolving HFQS, then summarizes our extensive data analysis results, and finally describes our discovery of the copper catalyst.
机构、总结、中文摘要均由AI分析而来，可能存在错误，请以论文正文为准。
