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arXiv 1904.00539cond-mat.mes-hallcond-mat.mtrl-sci
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氢化在SrTiO $_{3}$表面诱导二维导电层

Two-dimensional conducting layer on SrTiO$_{3}$ surface induced by hydrogenation

Y. Takeuchi, R. Hobara, R. Akiyama, A. Takayama, S. Ichinokura, R. Yukawa, I. Matsuda, S. Hasegawa

摘要:

我们发现在SrTiO $_{3}$(001)(STO)表面上氢化诱导的表面态不符合刚性带模型,这一点在真空中的原位电阻率测量得到了证实。随着STO上原子氢的暴露,在体带隙(间隙内状态)内出现新的表面状态(H诱导的施主状态,HDS),其将热激活的电子捐赠给体导带,导致表面下方的体带向下弯曲。掺杂的电子以平行于表面的二维方式流过空间电荷层。在电子输运的温度依赖性中观察到的半导体行为由载流子的热激活来解释。HDS和体导带在能量位置上是非刚性的,它们随着氢吸附的增加而靠近。最终HDS饱和其位置在体导带底部以下约88 meV。因此,薄层电导率也在1.95 $\pm$ ~ 0.02 $μ$ S/sq饱和。随着氢吸附的增加,相应于表面氢化的完成。

英文摘要:

We found that a surface state induced by hydrogenation on the surface of SrTiO$_{3}$(001) (STO) did not obey the rigid band model, which was confirmed by in situ electrical resistivity measurements in ultrahigh vacuum. With exposure of atomic hydrogen on the STO, a new surface state (H-induced donor state, HDS) appears within the bulk band gap (an in-gap state), which donates electrons thermally activated to the bulk conduction band, resulting in downward bending of the bulk bands beneath the surface. The doped electrons flow through the space-charge layer in two-dimensional manner parallel to the surface. The observed semiconducting behavior in the temperature dependence of electronic transport is explained by the thermal activation of carriers. The HDS and the bulk conduction band are non-rigid in energy position; they come closer with increasing the hydrogen adsorption. Eventually the HDS saturates its position around 88 meV below the bottom of the bulk conduction band. The sheet conductivity, accordingly, also saturates at 1.95$\pm$ 0.02 $μ$ S/sq. with increasing hydrogen adsorption, corresponding to completion of the hydrogenation of the surface.

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