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arXiv 1807.09006cond-mat.mtrl-scicond-mat.mes-hall
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通过衬底工程实现拓扑准独立的锡烯

Towards Topological Quasi-Freestanding Stanene via Substrate Engineering

Domenico Di Sante, Philipp Eck, Maximilian Bauernfeind, Marius Will, Ronny Thomale, Jörg Schäfer, Ralph Claessen, Giorgio Sangiovanni

摘要:

为了寻找新一代的自旋电子学硬件,室温量子自旋霍尔效应(QSHE)的候选材料已成为当代研究的热点。受石墨烯中QSHE的原始提议的启发,已经合成了几种异质结构,目的是为了通过增加自旋-轨道耦合来促进QSHE体带隙的较重IV族元素的六边形单层。然而,到目前为止,单层/基板耦合,这可以体现在应变,变形和杂交,已被证明是有害的所期望的QSHE条件的单层。具体集中在锡烯,锡类似物的石墨烯,我们研究如何插入缓冲层介导之间的单层和基板,以优化QSHE设置。从一个详细的密度泛函理论研究,我们突出了这样的缓冲层诱导的主要机制,以完成准自由站立的锡烯在其QSHE阶段。我们补充我们的理论预测,提出了第一个真正的尝试,生长在SiC(0001)上的锡烯可以沉积的缓冲层。

英文摘要:

In search for a new generation of spintronics hardware, material candidates for room temperature quantum spin Hall effect (QSHE) have become a contemporary focus of investigation. Inspired by the original proposal for QSHE in graphene, several heterostructures have been synthesized, aiming at a hexagonal monolayer of heavier group IV elements in order to promote the QSHE bulk gap via increased spin-orbit coupling. So far, however, the monolayer/substrate coupling, which can manifest itself in strain, deformation, and hybridization, has proven to be detrimental to the aspired QSHE conditions for the monolayer. Specifically focusing on stanene, the Sn analogue of graphene, we investigate how an interposing buffer layer mediates between monolayer and substrate in order to optimize the QSHE setting. From a detailed density functional theory study, we highlight the principal mechanisms induced by such a buffer layer to accomplish quasi-free standing stanene in its QSHE phase. We complement our theoretical predictions by presenting the first real attempts to grow a buffer layer on SiC(0001) on which stanene can be deposited.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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