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arXiv 1806.04849cond-mat.mtrl-sci
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全场电子能谱显微术在铁电材料中的应用

Full field electron spectromicroscopy applied to ferroelectric materials

N. Barrett, J. E. Rault, J. L. Wang, C. Mathieu, A. Locatelli, T. O. Mentes, M. A. Nino, S. Fusil, M. Bibes, A. Barthelemy, D. Sando, W. Ren, S. Prosandeev, L. … 展开作者

N. Barrett, J. E. Rault, J. L. Wang, C. Mathieu, A. Locatelli, T. O. Mentes, M. A. Nino, S. Fusil, M. Bibes, A. Barthelemy, D. Sando, W. Ren, S. Prosandeev, L. Bellaiche, B. Vilquin, A. Petraru, I. P. Krug, C. M. Schneider

摘要:

综述了光电子发射电子显微镜(PEEM)和低能电子显微镜(LEEM)技术在铁电材料电子结构和化学结构研究中的应用。这两种技术中的电子光学给出了几十纳米的空间分辨率。PEEM成像光电子,而LEEM成像反射和弹性背散射电子。PEEM和LEEM都可以用于直接和互易空间成像。它们一起提供了对表面电荷、功函数、形貌、化学映射、表面结晶度和能带结构的访问。介绍了铁电薄膜和单晶研究的应用实例。

英文摘要:

The application of PhotoEmission Electron Microscopy (PEEM) and Low Energy Electron Microscopy (LEEM) techniques to the study of the electronic and chemical structure of ferroelectric materials is reviewed. Electron optics in both techniques gives spatial resolution of a few tens of nanometres. PEEM images photoelectrons whereas LEEM images reflected and elastically backscattered electrons. Both PEEM and LEEM can be used in direct and reciprocal space imaging. Together, they provide access to surface charge, work function, topography, chemical mapping, surface crystallinity and band structure. Examples of applications for the study of ferroelectric thin films and single crystals are presented.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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