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arXiv 1302.4603cond-mat.mtrl-sci
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偏压下金属/铁电异质结界面电子结构

Interface Electronic Structure in a Metal/Ferroelectric Heterostructure under Applied Bias

J. E. Rault, G. Agnus, T. Maroutian, V. Pillard, Ph. Lecoeur, G. Niu, B. Vilquin, M. G. Silly, A. Bendounan, F. Sirotti, N. Barrett

摘要:

电极和铁电体之间的有效势垒高度取决于宏观电学性质和微观化学和电子结构。利用X射线光电子能谱学研究了Pt/BaTiO 3/Nb掺杂SrTiO 3电极/FE/电极结构在原位偏压下的行为。全频带对准被测量并且由传输测量支持。势垒高度取决于界面化学和FE极化。观察到的核心水平施加的偏压作为极化状态的函数的差分响应,与Callen电荷的界面附近的变化一致。

英文摘要:

The effective barrier height between an electrode and a ferroelectric (FE) depends on both macroscopic electrical properties and microscopic chemical and electronic structure. The behavior of a prototypical electrode/FE/electrode structure, Pt/BaTiO3/Nb-doped SrTiO3, under in-situ bias voltage is investigated using X-Ray Photoelectron Spectroscopy. The full band alignment is measured and is supported by transport measurements. Barrier heights depend on interface chemistry and on the FE polarization. A differential response of the core levels to applied bias as a function of the polarization state is observed, consistent with Callen charge variations near the interface.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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