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arXiv 1709.04592cond-mat.mes-hall
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非金属单层原子膜中的普适非挥发性电阻开关

Towards Universal Non-Volatile Resistance Switching in Non-metallic Monolayer Atomic Sheets

Ruijing Ge, Xiaohan Wu, Myungsoo Kim, Harry Chou, Sushant Sonde, Li Tao, Jack C. Lee, Deji Akinwande

摘要:

在这里,我们报告了有趣的观察稳定的非挥发性电阻开关(NVRS)的单层原子片夹在金属电极之间。在典型的半导体(MX2,M=Mo,W;和X=S,Se)过渡金属二硫属化物(TMD)和绝缘六方氮化硼(h-BN)中观察到NVRS,这暗示了这种现象在非金属2D单层中的普遍性,并且具有无成形切换的特征。NVRS现象的这种观察,广泛归因于离子扩散,细丝和界面氧化还原在体氧化物和电解质,激发了新的研究缺陷,离子传输和能量在原子薄片和导电电极之间的尖锐界面。从当代的角度来看,开关是所有更意想不到的单层,因为漏电流是超薄氧化物的基本限制。非易失性柔性存储器结构和大脑启发(神经形态)计算中的新兴设备概念可以从普遍的NVRS效应以及相关的广泛材料和工程协同设计机会中受益匪浅。在实验上,一个50 GHz的射频(RF)单层开关,这开辟了一个新的应用,电子零静态功率RF开关技术。

英文摘要:

Here, we report the intriguing observation of stable non-volatile resistance switching (NVRS) in single-layer atomic sheets sandwiched between metal electrodes. NVRS is observed in the prototypical semiconducting (MX2, M=Mo, W; and X=S, Se) transitional metal dichalcogenides (TMDs), and insulating hexagonal boron nitride (h-BN), which alludes to the universality of this phenomenon in non-metallic 2D monolayers, and features forming-free switching. This observation of NVRS phenomenon, widely attributed to ionic diffusion, filament and interfacial redox in bulk oxides and electrolytes, inspires new studies on defects, ion transport and energetics at the sharp interfaces between atomically-thin sheets and conducting electrodes. From a contemporary perspective, switching is all the more unexpected in monolayers since leakage current is a fundamental limit in ultra-thin oxides. Emerging device concepts in non-volatile flexible memory fabrics, and brain-inspired (neuromorphic) computing could benefit substantially from the pervasive NVRS effect and the associated wide materials and engineering co-design opportunity. Experimentally, a 50 GHz radio-frequency (RF) monolayer switch is demonstrated, which opens up a new application for electronic zero-static power RF switching technology.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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