laser诱导光刻的覆盖阈值
Coverage threshold for laser-induced lithography
摘要：
最近的实验观察的激光诱导吸附在碱蒸汽和电介质表面之间的界面已经证明了在电介质表面上生长纳米厚度的金属膜的可能性，与任意形状的光的强度分布确定。已表明，直接导致原子在辐照表面处积聚的机制涉及非常接近表面的原子的光电离。然而，存在一个蒸汽压力阈值启动薄膜生长仍然提出了问题的过程中发生在表面上。在这封信中，我们报告的观察，蒸气压阈值对应于一个最小的吸附原子覆盖所需的表面，以有效地中和传入的离子，使可能的多层膜的生长。我们讨论了覆盖阈值是表面电导率阈值的假设。
英文摘要：
Recent experimental observations of laser-induced adsorption at the interface between an alkali vapor and a dielectric surface have demonstrated the possibility of growing metallic films of nanometric thickness on dielectric surfaces, with arbitrary shapes determined by the intensity profile of the light. The mechanisms directly responsible for the accumulation of atoms at the irradiated surface have been shown to involve photo-ionization of atoms very close to the surface. However, the existence of a vapor-pressure threshold for initiating the film growth still raises questions on the processes occurring at the surface. In this letter, we report on the observation that the vapor-pressure threshold corresponds to a minimum adatom coverage necessary for the surface to effectively neutralize the incoming ions and make possible the growth of a multilayer film. We discuss the hypothesis that the coverage threshold is a surface conductivity threshold.
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