耗散光场作为原子光刻中强局域化结构的一种方法
Dissipative light field as a way to create strongly localized structures for atom lithography
摘要：
一般来说，深亚多普勒激光冷却的条件不匹配的条件，发生在更深的光学势，并因此，导致更大的温度的强原子局域化。此外，对于给定的深光学势失谐量，通常用于激光冷却量子描述的久期近似不再成立。本文基于原子密度矩阵的全量子方法，对原子在光学势中的局域化进行了分析。我们还表明，激光冷却在一个深的远失谐光学势，由一个具有偏振梯度的光场，可以作为一种替代方法，用于形成高对比度的原子的空间局域结构的原子光刻和原子纳米加工的目的。最后，我们执行的宽度和局部原子结构的对比度，可以在原则上达到这种类型的光掩模的可能限制的分析。
英文摘要：
Generally, the conditions for deep sub-Doppler laser cooling do not match the conditions for the strong atomic localization that takes a place in deeper optical potential and, in consequence, leads to larger temperature. Moreover, for a given detuning in a deep optical potential the secular approximation which is usually used for quantum description of laser cooling becomes no more valid. Here we perform an analysis of atomic localization in optical potential based on a full quantum approach for atomic density matrix. We also show that the laser cooling in a deep far-off detuned optical potential, created by a light field with a polarization gradient, can be used as an alternative method for forming high contrast spatially localized structures of atoms for the purposes of atom lithography and atomic nanofabrication. Finally, we perform an analysis of the possible limits for the width and the contrast of localized atomic structures that can in principle be reached by this type of the light mask.
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