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arXiv 1704.08038cond-mat.mtrl-sci
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清洁石墨烯:比较空气和真空中的热处理

Cleaning graphene: comparing heat treatments in air and in vacuum

Mukesh Tripathi, Andreas Mittelberger, Kimmo Mustonen, Clemens Mangler, Jani Kotakoski, Jannik C. Meyer, Toma Susi

摘要:

表面杂质和污染通常会严重降低石墨烯等二维材料的性能。为了去除污染,通常使用热退火。我们提出了在空气中和真空中的退火处理,非原位和“预原位”,其中超高真空处理室直接连接到像差校正的扫描透射电子显微镜的比较分析。虽然非原位处理确实去除了污染物,但在环境转移后获得原子级清洁的表面是具有挑战性的。然而,利用辐射或激光加热的预原位清洁似乎是可靠的,并且非常适合于清洁石墨烯而不会对其结构造成不适当的损坏。

英文摘要:

Surface impurities and contamination often seriously degrade the properties of two-dimensional materials such as graphene. To remove contamination, thermal annealing is commonly used. We present a comparative analysis of annealing treatments in air and in vacuum, both ex situ and "pre-situ", where an ultra-high vacuum treatment chamber is directly connected to an aberration-corrected scanning transmission electron microscope. While ex situ treatments do remove contamination, it is challenging to obtain atomically clean surfaces after ambient transfer. However, pre-situ cleaning with radiative or laser heating appears reliable and well suited to clean graphene without undue damage to its structure.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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