arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1010.4102cond-mat.mtrl-scicond-mat.other
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石墨纳米橡皮

Graphite Nanoeraser

Ze Liu, Peter. Bøggild, Jia-rui Yang, Yao Cheng, Francois Grey, Yi-lun Liu, Li Wang, Quan-shui Zheng

摘要:

本文介绍了一种从高取向热解石墨中清除中等尺寸(5~ 50 nm)杂质的方法。电子束沉积导致石墨烯和石墨表面上的碳质材料的连续增加,其难以通过常规技术去除。观察到使用石墨纳米擦除器的直接机械擦拭可大幅减少污染物的量。在机械去除污染物后,石墨表面能够在剪切后自缩回,表明范德华接触键合恢复。由于接触键合提供了一个清洁度水平的指示,通常只能在高品质的洁净室,我们讨论了潜在的应用在制备超净表面。

英文摘要:

We present here a method for cleaning intermediate-size (5~50nm) contamination from highly oriented pyrolytic graphite. Electron beam deposition causes a continuous increase of carbonaceous material on graphene and graphite surfaces, which is difficult to remove by conventional techniques. Direct mechanical wiping using a graphite nanoeraser is observed to drastically reduce the amount of contamination. After the mechanical removal of contamination, the graphite surfaces were able to self-retract after shearing, indicating that van der Waals contact bonding is restored. Since contact bonding provides an indication of a level of cleanliness normally only attainable in a high-quality clean-room, we discuss potential applications in preparation of ultraclean surfaces.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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