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arXiv 1702.03045cond-mat.mtrl-sci
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三层数码石墨烯在Ru(0001)上的堆叠依赖电子性质

Stacking-dependent electronic property of trilayer graphene epitaxially grown on Ru(0001)

Institute of Physics and University of Chinese Academy of Sciences, Chinese Academy of Sciences(中国科学院物理研究所和中国科学院大学)

Yande Que, Wende Xiao, Hui Chen, Dongfei Wang, Shixuan Du, Hong-Jun Gao

AI总结:

研究三层数码石墨烯在Ru(0001)上的生长、原子结构及电子性质,揭示不同堆叠顺序对密度态的影响,展示其作为探索石墨烯堆叠依赖电子性质的潜在平台。

摘要:

通过低温扫描隧道显微镜和光谱结合紧束缚近似计算,研究了三层数码石墨烯在Ru(0001)上的生长、原子结构及电子性质。三层数码石墨烯在Ru(0001)上表现出平坦表面,由于底层两层的屏蔽效应和顶层两层的AB堆叠,形成六边形晶格。底层两层中AA-和AB堆叠共存,导致三层数码石墨烯出现三种堆叠顺序:ABA-、ABC-和ABB-堆叠。通过STS测量结合TBA计算发现,ABC-和ABB-堆叠的三层数码石墨烯密度态在费米能级附近分别表现出一个和两个尖锐峰,与ABA-堆叠的V形特征不同。本工作表明,三层数码石墨烯在Ru(0001)上可能成为研究石墨烯堆叠依赖电子性质的理想平台。

英文摘要:

The growth, atomic structure, and electronic property of trilayer graphene (TLG) on Ru(0001) were studied by low temperature scanning tunneling microscopy and spectroscopy in combined with tight-binding approximation (TBA) calculations. TLG on Ru(0001) shows a flat surface with a hexagonal lattice due to the screening effect of the bottom two layers and the AB-stacking in the top two layers. The coexistence of AA- and AB-stacking in the bottom two layers leads to three different stacking orders of TLG, namely, ABA-, ABC-, and ABB-stacking. STS measurements combined with TBA calculations reveal that the density of states of TLG with ABC- and ABB-stacking is characterized by one and two sharp peaks near to the Fermi level, respectively, in contrast to the V-shaped feature of TLG with ABA-stacking. Our work demonstrates that TLG on Ru(0001) might be an ideal platform for exploring stacking-dependent electronic properties of graphene.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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