arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1702.00682cond-mat.mtrl-sciphysics.optics
收藏

IV-SiGeSn组核-壳纳米线中增强的IR Light Absorption

Enhanced IR Light Absorption in Group IV-SiGeSn Core-Shell Nanowires

Anis Attiaoui, Stephan Wirth, André-Pierre Blanchard-Dionne, Michel Meunier, J. M. Hartmann, Dan Buca, Oussama Moutanabbir

摘要:

含Sn的Si和Ge合金属于新兴的半导体家族,具有影响IV族半导体器件的潜力。事实上,独立设计晶格参数和带隙的能力是开发增强型或新型光子、光电和电子器件的前提。从这个角度来看,我们提出了详细的调查Ge 1-y-xSixSny层的Si和Ge基异质结构和纳米线的光学性质的影响。我们发现,在Si或Ge上添加薄的Ge 1-x-ySixSny覆盖层大大增强了光吸收,特别是在近红外范围内,导致短路电流密度增加。对于Ge 1-y-xSixSny结构,在厚度低于30 nm,一个14倍的短路电流增加预测相对于裸硅。这种增强通过减小覆盖层厚度而减小。相反,发现减小壳厚度改善Si/Ge 1-y-xSixSny和Ge/Ge 1-y-xSixSny核/壳纳米线中的短路电流。当增加Sn含量时,光吸收变得非常重要。此外,通过利用光学天线效应,这些纳米线显示出极端的光吸收,相对于Si或Ge纳米线,其达到增强因子,在Si/Ge0.84Si0.04Sn0.12中为约104,在Ge/Ge0.84Si0.04Sn0.12核/壳纳米线中为约12。此外,我们分析了由Si 3 N4组成的介电帽层添加到Si/Ge 1-y-xSixSny核-壳纳米线的光学响应,并且发现对于45 nm的介电层厚度和优于40 nm的核半径和壳厚度,短路电流密度增加约50%。芯/壳光学天线受益于由半导体部分中的漏模谐振和电介质部分中的介电效应贡献的增强的倍增。

英文摘要:

Sn-containing Si and Ge alloys belong to an emerging family of semiconductors with the potential to impact group IV semiconductor devices. Indeed, the ability to independently engineer both lattice parameter and band gap holds the premise to develop enhanced or novel photonic, optoelectronic, and electronic devices. With this perspective, we present detailed investigations of the influence of Ge1-y-xSixSny layers on the optical properties of Si- and Ge-based heterostructures and nanowires. We found that adding a thin Ge1-x-ySixSny capping layer on Si or Ge greatly enhances light absorption especially in the near IR range leading to an increase in short-circuit current density. For the Ge1-y-xSixSny structure at thicknesses below 30 nm, a 14-fold increase in the short-circuit current is predicted with respect to bare Si. This enhancement decreases by reducing the capping layer thickness. Conversely, decreasing the shell thickness was found to improve the short-circuit current in Si/Ge1-y-xSixSny and Ge/Ge1-y-xSixSny core/shell nanowires. The optical absorption becomes very important when increasing the Sn content. Moreover, by exploiting optical antenna effect, these nanowires show an extreme light absorption reaching an enhancement factor, with respect to Si or Ge nanowires, on the order of ~104 in Si/Ge0.84Si0.04Sn0.12 and ~12 in Ge/Ge0.84Si0.04Sn0.12 core/shell nanowires. Furthermore, we analyzed the optical response of the addition of a dielectric capping layer consisting of Si3N4 to the Si/Ge1-y-xSixSny core-shell nanowire and found about 50% increase in short-circuit current density for a dielectric layer thickness of 45 nm and a core radius and shell thickness superior to 40 nm. The core/shell optical antenna benefits from a multiplication of enhancements contributed by leaky mode resonances in the semiconductor part and antireflection effects in the dielectric part.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑