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arXiv 1607.01161physics.plasm-ph
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用RMP控制ELM:等离子体响应模型和边缘剥离响应的作用

ELM control with RMP: plasma response models and the role of edge peeling response

Yueqiang Liu, C. J. Ham, A. Kirk, Li Li, A. Loarte, D. A. Ryan, Youwen Sun, W. Suttrop, Xu Yang, Lina Zhou

摘要:

共振磁微扰(RMP)已被广泛证明是一种可行的技术,用于减轻或抑制大边缘局域模(ELMs)。与此相关的是近年来大量的理论和建模工作。在文献中已经提出了各种模型描述的等离子体响应的RMP字段,并简要回顾了这项工作。尽管它们简单,线性响应模型可以提供替代标准,而不是基于真空场的标准,用于指导线圈配置的选择,以实现ELM的最佳控制。边缘剥离响应的RMP字段的作用被示出为在低碰撞等离子体中的ELM缓解的关键指标,在各种托卡马克装置。

英文摘要:

Resonant magnetic perturbations (RMP) have extensively been demonstrated as a plausible technique for mitigating or suppressing large edge localized modes (ELMs). Associated with this is a substantial amount of theory and modelling efforts during recent years. Various models describing the plasma response to the RMP fields have been proposed in the literature, and are briefly reviewed in this work. Despite their simplicity, linear response models can provide alternative criteria, than the vacuum field based criteria, for guiding the choice of the coil configurations to achieve the best control of ELMs. The role of the edge peeling response to the RMP fields is illustrated as a key indicator for the ELM mitigation in low collisionality plasmas, in various tokamak devices.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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