arXivDaily arXiv每日学术速递 周一至周五更新
arXiv周末暂无论文更新,休息一下吧,周末愉快~~
arXiv 1604.03232cond-mat.mtrl-sci
收藏

缺陷容限单层过渡金属二硫属化合物

Defect Tolerant Monolayer Transition Metal Dichalcogenides

Mohnish Pandey, Filip A. Rasmussen, Korina Kuhar, Thomas Olsen, Karsten W. Jacobsen, Kristian S. Thygesen

摘要:

由于晶体缺陷而在半导体的带隙内形成的局部电子态可能对材料的光电性质有害。具有较低的形成缺陷诱导的深隙态的倾向的半导体被称为缺陷容忍的。在这里,我们提供了一个系统的第一性原理调查的缺陷容限在29个单层过渡金属二硫属化物(TMD)的纳米级光电子学的兴趣。我们发现,基于VI族和X族金属的TMD形成深间隙状态时,创建的硫属元素(S,Se,Te)的空缺,而基于IV族金属的TMD只形成浅的缺陷能级,因此预测是缺陷容忍。有趣的是,所有的缺陷敏感的TMD具有非常相似的轨道组成的价带和导带。这表明间隙的成键/反键性质,这反过来表明悬挂键将落入间隙内。通过引入一个描述符来度量导带和价带流形的相似程度,这些想法被定量化了。最后,研究被推广到非极性纳米带的TMD,我们发现,只有缺陷敏感的材料形成的带隙内的边缘状态。

英文摘要:

Localized electronic states formed inside the band gap of a semiconductor due to crystal defects can be detrimental to the material's optoelectronic properties. Semiconductors with lower tendency to form defect induced deep gap states are termed defect tolerant. Here we provide a systematic first principles investigation of defect tolerance in 29 monolayer transition metal dichalcogenides (TMDs) of interest for nanoscale optoelectronics. We find that the TMDs based on group VI and X metals form deep gap states upon creation of a chalcogen (S, Se, Te) vacancy while the TMDs based on group IV metals form only shallow defect levels and are thus predicted to be defect tolerant. Interestingly, all the defect sensitive TMDs have valence and conduction bands with very similar orbital composition. This indicates a bonding/anti-bonding nature of the gap which in turn suggests that dangling bonds will fall inside the gap. These ideas are made quantitative by introducing a descriptor that measures the degree of similarity of the conduction and valence band manifolds. Finally, the study is generalized to non-polar nanoribbons of the TMDs where we find that only the defect sensitive materials form edge states within the band gap.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑