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arXiv 1509.04641cond-mat.mtrl-sci
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硅烯和锗烯衬底的设计:第一性原理计算

Designing substrates for silicene and germanene: First-principles calculations

M. X. Chen, Z. Zhong, M. Weinert

摘要:

我们提出了一个指导方针,探索基板,稳定的单层蜂窝结构的硅烯和锗烯,同时保持狄拉克状态:除了具有较强的结合能的单层,一个合适的基板应该是一个大的间隙半导体与适当的功函数,使狄拉克点位于间隙和远离基板状态时,他们的频带对齐。我们通过对硅烯和锗烯在Al封端的Al_2O_3(0001)表面上的第一性原理计算来说明我们的想法。在Al封端的Al2O3(0001)上的覆盖单分子膜通过与硅烯和Ag(111)之间的结合能相当的结合能保持低屈曲蜂窝结构的主要结构轮廓。用k投影法得到的展开能带结构表明,由于结构畸变和与衬底的相互作用,在K点处形成了带隙的狄拉克锥。负载的硅烯和锗烯的禁带宽度分别为0.4 eV和0.3 eV,表明它们可能在纳米电子学中具有潜在的应用。

英文摘要:

We propose a guideline for exploring substrates that stabilize the monolayer honeycomb structure of silicene and germanene while simultaneously preserve the Dirac states: in addition to have a strong binding energy to the monolayer, a suitable substrate should be a large-gap semiconductor with a proper workfunction such that the Dirac point lies in the gap and far from the substrate states when their bands align. We illustrate our idea by performing first-principles calculations for silicene and germanene on the Al-terminated (0001) surface of Al2O3 . The overlaid monolayers on Al-terminated Al2O3(0001) retain the main structural profile of the low-buckled honeycomb structure via a binding energy comparable to the one between silicene and Ag(111). Unfolded band structure derived from the k-projection method reveals that gapped Dirac cone is formed at the K point due to the structural distortion and the interaction with the substrate. The gaps of 0.4 eV and 0.3 eV respectively for the supported silicene and germanene suggest that they may have potential applications in nanoelectronics.

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