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arXiv 1507.02773cond-mat.mes-hall
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铱修饰石墨烯的电子输运性质

Electronic transport properties of Ir-decorated graphene

Yilin Wang, Shudong Xiao, Xinghan Cai, Wenzhong Bao, Janice Reutt-Robey, Michael S. Fuhrer

摘要:

用5d过渡金属原子修饰的石墨烯被预测表现出许多有趣的性质;例如,铱吸附原子被提出在石墨烯中诱导大量的拓扑间隙。我们广泛地研究了在超高真空中低温(7 K)沉积的铱修饰的单层石墨烯的导电性作为Ir浓度、载流子密度、温度和退火条件的函数。我们的研究结果与低温下形成约100个原子的Ir簇一致,每个簇向石墨烯提供单个电子电荷。退火石墨烯增加了簇的尺寸,减少了掺杂并增加了迁移率。我们没有观察到任何由自旋轨道耦合引起的能隙的迹象,这可能是由于Ir的聚集。

英文摘要:

Graphene decorated with 5d transitional metal atoms is predicted to exhibit many intriguing properties; for example iridium adatoms are proposed to induce a substantial topological gap in graphene. We extensively investigated the conductivity of single-layer graphene decorated with iridium deposited in ultra-high vacuum at low temperature (7 K) as a function of Ir concentration, carrier density, temperature, and annealing conditions. Our results are consistent with the formation of Ir clusters of ~100 atoms at low temperature, with each cluster donating a single electronic charge to graphene. Annealing graphene increases the cluster size, reducing the doping and increasing the mobility. We do not observe any sign of an energy gap induced by spin-orbit coupling, possibly due to the clustering of Ir.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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