arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1504.03466cond-mat.mtrl-scicond-mat.mes-hall
收藏

Metal-MoS2接口上的载波传输

Carrier Transport at the Metal-MoS2 Interface

Faisal Ahmed, Min Sup Choi, Xiaochi Liu, Won Jong Yoo

摘要:

这项研究说明了场效应晶体管(FET)器件中金属电极和二硫化钼沟道界面之间的电子输运性质及其从一种机制到另一种机制的转变。有趣的是,作为温度的函数的接触电阻(Rc)的测量表明在载流子传输的能量势垒从在高温下的电子发射隧穿在低温下的过渡。此外,在低温下,隧穿行为的性质是确定的电流-电压依赖性,这有助于我们功能直接隧穿在低偏压和福勒-诺德海姆隧穿在高偏压的Pd-MoS 2接触由于有效的势垒形状调制偏置。相比之下,只有直接隧穿观察到的Cr-MoS 2接触在整个施加的偏置范围。此外,还对选通范围内的Rc进行了简单的解析计算,计算结果与实验数据一致。我们的研究结果描述了载流子传输机制在金属-MoS 2界面上的转变,这些信息为基于二维材料的未来柔性透明电子器件的设计提供了指导。

英文摘要:

This study illustrates the nature of electronic transport and its transition from one mechanism to another between a metal electrode and MoS2 channel interface in a field effect transistor (FET) device. Interestingly, measurements of the contact resistance (Rc) as a function of temperature indicate a transition in the carrier transport across the energy barrier from a thermionic emission at a high temperature to tunneling at a low temperature. Furthermore, at a low temperature, the nature of the tunneling behavior is ascertained by the current-voltage dependency that helps us feature direct tunneling at a low bias and Fowler-Nordheim tunneling at a high bias for a Pd-MoS2 contact due to the effective barrier shape modulation by biasing. In contrast, only direct tunneling is observed for a Cr-MoS2 contact over the entire applied bias range. In addition, simple analytical calculations were carried out to extract Rc at the gating range, and the results are consistent with the experimental data. Our results describe the transition in carrier transport mechanisms across a metal-MoS2 interface, and this information provides guidance for the design of future flexible, transparent electronic devices based on 2-dimensional materials.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

↑