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arXiv 1306.5086cond-mat.mes-hallcond-mat.mtrl-sci
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Ni电极下石墨烯中载流子密度的调制

Carrier density modulation in graphene underneath Ni electrode

T. Moriyama, K. Nagashio, T. Nishimura, A. Toriumi

摘要:

我们研究了金属下石墨烯的输运性质,以揭示石墨烯场效应晶体管中源/漏电极下石墨烯中的载流子密度是否是固定的。石墨烯/Ni双层结构的电阻已经显示出类似石墨烯的背栅偏压依赖性。换句话说,石墨烯的电性能不会受到其与Ni接触的显著影响。这种意外的结果可以归因于金属/石墨烯界面处的抗蚀剂残留物,这可以减少石墨烯和金属之间的相互作用。在使用具有有机抗蚀剂的常规光刻技术制造的背栅器件中,当讨论金属/石墨烯接触时,应当考虑金属电极下方的石墨烯中的载流子密度调制。

英文摘要:

We investigate the transport properties of graphene underneath metal to reveal whether the carrier density in graphene underneath source/drain electrodes in graphene field-effect transistors is fixed. The resistance of the graphene/Ni double-layered structure has shown a graphene-like back-gate bias dependence. In other words, the electrical properties of graphene are not significantly affected by its contact with Ni. This unexpected result may be ascribed to resist residuals at the metal/graphene interface, which may reduce the interaction between graphene and metals. In a back-gate device fabricated using the conventional lithography technique with an organic resist, the carrier density modulation in the graphene underneath the metal electrodes should be considered when discussing the metal/graphene contact.

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