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arXiv 1502.01624cond-mat.mes-hallquant-ph
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一种用于Si/SiGe量子点的可重构门架构

A Reconfigurable Gate Architecture for Si/SiGe Quantum Dots

D. M. Zajac, T. M. Hazard, X. Mi, K. Wang, J. R. Petta

摘要:

我们展示了一个可重构的量子点门架构,包括两个可互换的传输通道。一个通道用于形成量子点,另一个用于电荷感测。量子点传输通道可以支持单个或双量子点。我们证明了几个电子占领在一个单一的量子点和提取充电能量高达6.6毫电子伏。磁谱仪用于测量35-70微电子伏特范围内的谷分裂。通过激励两个额外的栅极,我们形成了一个少电子双量子点,并展示了可调隧道耦合在(1,0)到(0,1)点间电荷跃迁。

英文摘要:

We demonstrate a reconfigurable quantum dot gate architecture that incorporates two interchangeable transport channels. One channel is used to form quantum dots and the other is used for charge sensing. The quantum dot transport channel can support either a single or a double quantum dot. We demonstrate few-electron occupation in a single quantum dot and extract charging energies as large as 6.6 meV. Magnetospectroscopy is used to measure valley splittings in the range of 35-70 microeV. By energizing two additional gates we form a few-electron double quantum dot and demonstrate tunable tunnel coupling at the (1,0) to (0,1) interdot charge transition.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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