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arXiv 1407.2668cond-mat.mes-hall
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少层2 H- TaS2器件中电荷密度波的输运和电容特性

Transport and Capacitance properties of Charge Density Wave in few layer 2H-TaS2 Devices

Y. F. Cao, K. M. Cai, L. J. Li, W. J. Lu, Y. P. Sun, K. Y. Wang

摘要:

我们仔细研究了少层电荷密度波(CDW)2 H-TaS 2器件的输运和电容特性。不同器件的CDW转变温度和阈值电压不同,这归因于这些基于少层2 H-TaS 2薄片的微器件的层间相互作用和不均匀的局部缺陷。在我们的实验中,2 H-TaS_2器件在低温下观察到半导体性质而不是金属性质。对于存在CDW的不同测量器件,相对阈值电压的温度依赖性可以缩放到(1- T / Tr)^0.5 +delta,其中delta=0.08。同时进行电导-电压和电容-电压测量。在很低的交流有源电压下,我们发现这两种测量的磁滞回线完全匹配。我们的结果指出,电容-电压测量也可以用来确定CDW的阈值脱钉电压,这为我们研究CDW提供了一种新的方法。

英文摘要:

We carefully investigated the transport and capacitance properties of few layer charge density wave (CDW) 2H-TaS2 devices. The CDW transition temperature and the threshold voltage vary from device to device, which is attributed to the interlayer interaction and inhomogeneous local defects of these micro-devices based on few layer 2H-TaS2 flakes. Semiconductivity rather than metallic property of 2H-TaS2 devices was observed in our experiment at low temperature. The temperature dependence of the relative threshold voltage can be scaled to (1- T / Tr )^0.5+delta with delta=0.08 for the different measured devices with presence of the CDWs. The conductance-voltage and capacity-voltage measurements were performed simultaneously. At very low ac active voltage, we found that the hysteresis loops of these two measurements exactly match each other. Our results point out that the capacity-voltage measurements can also be used to define the threshold depinning voltage of the CDW, which give us a new method to investigate the CDWs.

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