我们仔细研究了少层电荷密度波(CDW)2 H-TaS 2器件的输运和电容特性。不同器件的CDW转变温度和阈值电压不同,这归因于这些基于少层2 H-TaS 2薄片的微器件的层间相互作用和不均匀的局部缺陷。在我们的实验中,2 H-TaS_2器件在低温下观察到半导体性质而不是金属性质。对于存在CDW的不同测量器件,相对阈值电压的温度依赖性可以缩放到(1- T / Tr)^0.5 +delta,其中delta=0.08。同时进行电导-电压和电容-电压测量。在很低的交流有源电压下,我们发现这两种测量的磁滞回线完全匹配。我们的结果指出,电容-电压测量也可以用来确定CDW的阈值脱钉电压,这为我们研究CDW提供了一种新的方法。
英文摘要:
We carefully investigated the transport and capacitance properties of few layer charge density wave (CDW) 2H-TaS2 devices. The CDW transition temperature and the threshold voltage vary from device to device, which is attributed to the interlayer interaction and inhomogeneous local defects of these micro-devices based on few layer 2H-TaS2 flakes. Semiconductivity rather than metallic property of 2H-TaS2 devices was observed in our experiment at low temperature. The temperature dependence of the relative threshold voltage can be scaled to (1- T / Tr )^0.5+delta with delta=0.08 for the different measured devices with presence of the CDWs. The conductance-voltage and capacity-voltage measurements were performed simultaneously. At very low ac active voltage, we found that the hysteresis loops of these two measurements exactly match each other. Our results point out that the capacity-voltage measurements can also be used to define the threshold depinning voltage of the CDW, which give us a new method to investigate the CDWs.
Van der Waals moiré materials have emerged as a highly controllable platform to study the electronic correlation phenomena. In particular, robust correlated insulating states have recently been discovered at both integer and fractional filling factors of the semiconductor moiré systems. Here, we reveal the thermodynamic properties of these states by measuring the gate capacitance of MoSe2/WS2 moiré superlattices. We observe a series of incompressible states for filling factor 0 - 8 and anomalously large capacitance (nearly 60% above the device's geometrical capacitance) in the intervening comp…
We present a physics-based circuit-compatible model for double-gated two-dimensional semiconductor based field effect transistors, which provides explicit expressions for the drain current, terminal charges and intrinsic capacitances. The drain current model is based on the drift-diffusion mechanism for the carrier transport and considers Fermi-Dirac statistics coupled with an appropriate field-effect approach. The terminal charge and intrinsic capacitance models are calculated adopting a Ward-Dutton linear charge partition scheme that guarantees charge-conservation. It has been implemented in…
Capacitance and charge relaxation resistance of chaotic cavities - Joint distribution of two linear statistics in the Laguerre ensemble of random matrices
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DGIST Research Institute, DGIST(大邱冈科学技术院研究院);Department of Physics and Chemistry, DGIST(大邱冈科学技术院物理化学系);Quantum Technology Institute, Korea Research Institute of Standards and Science(韩国标准科学研究院量子技术研究所);Industrial AX Innovation Research Institute and Sensor Technology Support Center, DGIST(大邱冈科学技术院工业AX创新研究所和传感器技术支持中心);Research Center for Materials Nanoarchitectonics, National Institute for Materials Science(物质材料研究机构材料纳米结构研究中心);Research Center for Electronic and Optical Materials, National Institute for Materials Science(物质材料研究机构电子光学材料研究中心);Department of Physics, Kyungpook National University(庆北大学物理系);Department of Interdisciplinary Engineering, DGIST(大邱冈科学技术院交叉工程系)
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Small-signal model for 2D-material based field-effect transistors targeting radio-frequency applications: the importance of considering non-reciprocal capacitances
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We suggest a possible realization of a solid-state memory capacitive (memcapacitive) system. Our approach relies on the slow polarization rate of a medium between plates of a regular capacitor. To achieve this goal, we consider a multi-layer structure embedded in a capacitor. The multi-layer structure is formed by metallic layers separated by an insulator so that non-linear electronic transport (tunneling) between the layers can occur. The suggested memcapacitor shows hysteretic charge-voltage and capacitance-voltage curves, and both negative and diverging capacitance within certain ranges of …