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arXiv 1401.0183cond-mat.mes-hallcond-mat.dis-nn
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二维半导体结构中短程无序对电子输运的影响

Short-range disorder effects on electronic transport in 2D semiconductor structures

S. Das Sarma, E. H. Hwang

摘要:

我们从理论上研究了短程无序在确定GaAs基结构中的低温二维迁移率方面相对于库仑无序的相对重要性,库仑无序被认为是半导体系统中的主导无序。我们给出的结果为未屏蔽和屏蔽短程无序的影响量子阱和异质结中的二维流动性,与库仑无序的结果相比,并发现渐近高密度的流动性总是有限的短程无序,在一般情况下,变得有效地更强与增加的“载流子密度”相反,库仑无序。我们还预测了一个有趣的重入金属绝缘体的转变,在非常高的载流子密度在硅MOSFET驱动的短程无序与表面粗糙度散射。

英文摘要:

We study theoretically the relative importance of short-range disorder in determining the low-temperature 2D mobility in GaAs-based structures with respect to Coulomb disorder which is known to be the dominant disorder in semiconductor systems. We give results for unscreened and screened short-range disorder effects on 2D mobility in quantum wells and heterostructures, comparing with the results for Coulomb disorder and finding that the asymptotic high-density mobility is always limited by short-range disorder which, in general, becomes effectively stronger with increasing `carrier density' in contrast to Coulomb disorder. We also predict an intriguing re-entrant metal-insulator transition at very high carrier densities in Si-MOSFETs driven by the short-range disorder associated with surface roughness scattering.

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