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arXiv 1302.3523cond-mat.mes-hall
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n-p-n和n-2D拓扑绝缘体-n结中的量子霍尔效应

Quantum Hall effect in n-p-n and n-2D Topological Insulator-n junctions

G. M. Gusev, A. D. Levin, Z. D. Kvon, N. N. Mikhailov, S. A. Dvoretsky

摘要:

我们研究了HgTe阱中的量子化输运,该阱具有对应于局部控制密度的二维拓扑绝缘体相(2D TI)的反转能带结构,允许n-p-n和n-2D TI-n结。电阻揭示了在强垂直磁场存在下n-p-n区域中的分数平台$2h/e^{2}$。我们发现,在n-2D TI-n区域,电阻的平台并不普遍,而是由手征边缘模和螺旋边缘模之间的界面处的边缘态平衡引起的。给出了描述n-2D TI-n区电阻量子化的简单模型。

英文摘要:

We have studied quantized transport in HgTe wells with inverted band structure corresponding to the two-dimensional topological insulator phase (2D TI) with locally-controlled density allowing n-p-n and n-2D TI-n junctions. The resistance reveals the fractional plateau $2h/e^{2}$ in n-p-n regime in the presence of the strong perpendicular magnetic field. We found that in n-2D TI-n regime the plateaux in resistance in not universal and results from the edge state equilibration at the interface between chiral and helical edge modes. We provided the simple model describing the resistance quantization in n-2D TI-n regime.

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