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arXiv 1301.0966cond-mat.mes-hallcond-mat.mtrl-sci
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具有半导体栅的石墨烯结构中的击穿电子-空穴对称性

Breakdown electron-hole symmetry in graphene structure with a semiconductor gate

F. T. Vasko

摘要:

结构“石墨烯-绝缘衬底-半导体栅极”中的电子-空穴对称性由于在正偏压或负偏压下半导体栅极中的电势的不对称下降而被破坏。计算了SiO_2衬底置于低(中)掺杂p-Si上时,掺杂浓度和电导率与栅压的关系。对于高kappa衬底(AlN、Al_2O_3、HfO_2和ZrO_2)的情况,分析了光学电导率的类似依赖性。我们的结果与实验数据的比较表明,这两种情况下,一个很好的协议。

英文摘要:

The electron-hole symmetry in the structure "graphene - insulating substrate -semiconductor gate" is violated due to an asymmetrical drop of potential in the semiconductor gate under positive or negative biases. The gate voltage dependencies of concentration and conductivity are calculated for the case of SiO_2 substrate placed over low- (moderate-) doped p-Si. Similar dependencies of the optical conductivity are analyzed for the case of high-kappa substrates (AlN, Al_2O_3, HfO_2, and ZrO_2). The comparison of our results with experimental data shows a good agreement for both cases.

机构、总结、中文摘要均由AI分析而来,可能存在错误,请以论文正文为准。

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