arXivDaily arXiv每日学术速递 周一至周五更新
arXiv 1107.0135cond-mat.str-el
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Ag(001)衬底上掺杂NiO薄膜电荷涨落能的降低

Reduction of charge fluctuation energies in ultrathin NiO films on Ag(001)

Seolun Yang, H. -K. Park, J. -S. Kim, H. -N. Hwang, C. -C. Hwang, S. -H. Phark, Y. J. Chang, T. W. Noh, H. -D. Kim

摘要:

利用X射线光电子能谱学和俄歇电子能谱研究了Ag(001)衬底上Ni-NiO薄膜中两个3 p空穴U(Ni 3 p)之间的库仑作用能.随着薄膜变薄,U(Ni 3 p)单调减小,单层(ML)薄膜的U(Ni 3 p)与块状厚膜的U(Ni 3 p)之差δU(Ni 3 p)达到~-2.2eV。1 ML膜的δU(Ni 3 p)值与体块厚膜的像势和极化能之差很好地再现了1 ML膜的δ U值。因此,本结果为Duffy等人最初提出的图像[J. Phys. C:Solid State Phys.,16,4087(1983)]和Altieri等人[Phys.Rev.B59,R2517(1999)]

英文摘要:

We investigate on-site Coulomb interaction energy between two 3p holes U(Ni 3p) of ultrathin NiO films on Ag(001) by both x-ray photoelectron spectroscopy and Auger electron spectroscopy. As the film becomes thin, U(Ni 3p) monotonically decreases, and the difference of U(Ni 3p) for 1 monolayer (ML) film from that of bulk-like thick film δU(Ni 3p) reaches ~ -2.2 eV. The observed δU(Ni 3p) for 1 ML film is well reproduced by the differences of both the image potential and polarization energies between 1 ML film and the bulk-like thick film. Hence, the present results provide an evidence for the picture originally proposed by Duffy et al. [J. Phys. C: Solid State Phys., 16, 4087 (1983)] and Altieri et al. [Phys. Rev. B 59, R2517 (1999)]

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